The Study of Interface Diffusion and Reaction Between Cr and Diamond Deposited by Magnetron Sputtering Technigue

ZHU Yong-fa,WANG Li,YAO Wen-qing,CAO Li-li
DOI: https://doi.org/10.3969/j.issn.1001-4381.2000.01.006
2000-01-01
Abstract:A Cr layer with thickness of 150nm was successfully deposited on the surface of diamond particles using DC magnetron sputtering technique. The interface diffusion and reaction between Cr layer and diamond substrate have been studied using AES depth profile and line shape analyses. The results show that interface diffusion and reaction take place during the deposition of Cr layer. The Cr atoms diffuse into diamond substrate, and react with carbon atom in diamond to form carbide on the interface. The interface diffusion and reaction result from the impact of Cr atoms which keep an energy of 3~4eV. The interface diffusion and reaction can be promoted significantly by raising the sputtering power.
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