Abstract:Titanium carbide (TiC x ) films were deposited by reactively sputtering Ti target with varied methane (CH4) flow rates using an unbalanced magnetron sputtering equipment operating in conventional (CMS) and plasma-enhanced (PEMS) mode. The microstructure and properties of the TiC x films were mainly scrutinized with X-ray photoelectron spectroscopy, X-ray diffraction, scanning electron microscopy, nano indentation, and ball-on-disk tribo-test. As the CH4 flow rate is increased from 4 to 16 sccm, x in the TiC x films deposited by PEMS and CMS is gradually increased from 0.28 to 0.96 and 0.28 to 0.73, respectively; and the concentration of TiC phase in the films rises. A densified microstructure with strong preferred growth is observed in the PEMS-deposited films, while a loose columnar microstructure with almost random growth exists in the CMS-deposited films. When the CH4 flow rate is increased, the hardness of the films deposited by PEMS is firstly increased and then decreased, and reaches a maximum value of 29.6 GPa; but that of CMS-TiC x film is fluctuated below 10.6 GPa. The friction coefficient of TiC x -coated samples against pure aluminum is gradually increased with increasing CH4 flow rate from 4 to 14 sccm, accompanied by a reduction of the aluminum adhesion. The wear rate of the TiC x -coated samples as a function of the CH4 flow rate is firstly decreased and then increased. The lowest wear rate of the PEMS-prepared samples is 7.2 × 10−16 m3/(N·m) obtained at a CH4 flow rate of 14 sccm, while that of the CMS-prepared samples is 9.3 × 10−15 m3/(N·m) obtained at 12 sccm. Therefore, PEMS is a promising method to prepare TiC x films with a good combination of the mechanical properties and wear-resistance against pure aluminum.

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