Abstract:Germanium carbide(Ge1-xCx)films have numerous attractive properties,which make them promising candidates for applications in the field of multilayer antireflection and protection coating of IR window.Although many investigations on the Ge1-xCx films prepared by different deposition techniques have been performed,it is still difficult to summarize from the literature and thus to understand the relationships between the growth process and the film properties.Effects of experimental parameters such as growth temperature on the composition and properties of Ge1-xCx films deposited by reactive magnetron sputtering are not well explored.In this work,the effects of growth temperature(Tg)on the composition,optical and mechanical properties for Ge1-xCx films,prepared via reactive magnetron sputtering,have been investigated.It is found that Ts remarkably influences the film composition,which results in a pronounced change in the refractive index,optical gap and hardness of the film.As Tg increases from 60 ℃ to 500 ℃,the content of carbon and hydrogen in the film decreases,which leads to a significant increase in the refractive index from 2.3 to 4.3 and an accompanying decrease in the optical gap from 1.4 eV to 1.0 eV.Furthermore,with increa-sing Tg the fraction of C—H and Ge—H bonds in Ge1-xCx film decreases,which significantly decreases optical absorption at ~5.3 μm and ~3.4 μm,and at the same time enhances the hardness of the film.These results suggest that growth temperature is one of key parameters for preparing Ge1-xCx films with excellent performance.

The deposition and optical properties of Ge1−xCx thin film and infrared multilayer antireflection coatings

Preparation of Ge1-xCx Thin Film and Its Infrared Properties

Studies on Infrared Absorption Loss of Antireflection Coatings on Germanium and Potassium Chloride Substrates at the Wavelength of 10.6μm by Photothermal Deflection Technique

Mechanical and Environmental Properties of Ge1−xCx Thin Film

Non‐hydrogenated Amorphous Germanium Carbide with Adjustable Microstructure and Properties: a Potential Anti‐reflection and Protective Coating for Infrared Windows

Performance Improvement of Germanium Carbide Films by Increasing Growth Temperature

Role of carbon in the formation of hard Ge1−xCx thin films by reactive magnetron sputtering

Ge1–xCx double-layer antireflection and protection coatings

The Effects of Substrate Temperature on the Composition and IR Transmission Properties of Germanium Carbon Films Deposited by Reactive RF Magnetron Sputtering

Optical and Electrical Properties of Nonstoichiometric A-Ge1−xcx Films Prepared by Magnetron Co-Sputtering

Microstructure and Optical Properties of Ge Films Prepared by Ion Beam Assisted Deposition

Multilayer Antireflective and Protective Coatings Comprising Amorphous Diamond and Amorphous Hydrogenated Germanium Carbide for Zns Optical Elements

The surface topography, structural and mechanical properties of Ge 1 - XCx films prepared by magnetron co-sputtering

Evaluation of chemical and structural properties of germanium-carbon coatings deposited by plasma enhanced chemical vapor deposition

Chemical Bonding and Optical Properties of Germanium–carbon Alloy Films Prepared by Magnetron Co-Sputtering As a Function of Substrate Temperature

Chemical Vapor Deposition of Ge on GaN/Al2O3(0001) Substrates

Absorption, Structural, and Electrical Properties of Ge Films Prepared by Ion-Beam-assisted Deposition.

Structure and optical properties of GeGaS films deposited by thermal evaporation

Ge Deposited at Different Substrate Temperatures and Its Impact on SiC Films Growth

Structure and optical properties of GeTe film controlled by amorphous to crystalline phase transition

Chemical Bonding of A-Ge1−xcx:H Films Grown by RF Reactive Sputtering