Abstract:The deposition parameters used during the sputtering process are instrumental in determining the properties of the deposited films and can be optimised to produce thin film coatings that are suitable for specific engineering applications. Deposition parameters such as radio frequency (RF) power, oxygen flow rate, and substrate temperature can be varied during deposition to alter or tune the film structure, stoichiometry, and invariably the functional properties of the prepared thin films. In this paper, chromium oxide thin films prepared by reactive magnetron sputtering under various RF powers were characterised for their work function property and stability in Ringer's solution. The structural, oxide phase and growth modes of the films were probed with X-ray diffraction (XRD), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and scanning electron microscope (SEM). The electrochemical stability and corrosion behaviour of the films were evaluated using an open circuit potential (OCP) measurements, cyclic polarisation, and Mott–Schottky analysis, while the work function (WF) was determined with a Kelvin probe. The XRD and Raman investigations showed that the films are predominantly amorphous with Cr 2 O 3 being the main oxide phase. A mixture of columnar and layer-by-layer growth modes was observed in the deposited films with 500 W, 10 sccm sample showing rougher morphology due to the higher sputtering power. The OCP and cyclic polarisation results showed that the film prepared at a deposition power of 300 W and at an oxygen flow rate of 10 sccm possesses higher film passivation and breakdown potentials, hence, better corrosion resistance when compared to films prepared at higher deposition powers. The finding is further supported by the Mott–Schottky and work function investigations where the same film also showed lower defect density and higher work function values compared to the films deposited at higher powers. A correlation was found between the corrosion, work function and defect density which suggests that both parameters can possibly be used to predict and rank corrosion in thin films. We expect our findings to be significant for future corrosion and wear applications for metals/alloys requiring protection against environmental degradation.

Deposition of chromium-carbon films by magnetron sputtering of chromium and carbon targets

Deposition of Dense SiO2 Thin Films for Electrical Insulation Applications by Microwave ECR Plasma Source Enhanced RF Reactive Magnetron Sputtering

Deposition of M-C (M = Cr, Mn, Fe) films by magnetron sputtering

DEPOSITION OF <font>M</font>—<font>C</font> (<font>M</font> = <font>Cr</font>, <font>Mn</font>, <font>Fe</font>) FILMS BY MAGNETRON SPUTTERING

Nitride Films Deposited from an Equimolar Al–Cr–Mo–Si–Ti Alloy Target by Reactive Direct Current Magnetron Sputtering

Microstructure, Mechanical and Tribological Properties of Si and Al Co-Doped Hydrogenated Amorphous Carbon Films Deposited at Various Bias Voltages

CHARACTERIZING CRYSTALLINE CHROMIUM OXIDE THIN FILM GROWTH PARAMETERS

Preparation and Characterization of Chromium Oxide Thin Films: the Response of Morphology, Crystal Structure, and Electrical Properties to Oxygen Pressure under Magnetron Sputtering

Structural and Mechanical Properties of CrN Thin Films Deposited on Si Substrate by Using Magnetron Techniques

Nanomechanical Properties and Surface Wettability of Carbon Films Prepared by Magnetron Sputtering

Synthesis, composition, surface roughness and mechanical properties of thin nitrogenated carbon films

Formation and Mechano-Chemical Properties of Chromium Fluorides Originated from the Deposition of Carbon-Chromium Nanocomposite Coatings in the Reactive Atmosphere (Ar + CF4) during Magnetron Sputtering

Influence of radio frequency magnetron sputtering parameters on the structure and performance of SiC films

Effects of Bias Voltage on Structure and Properties of Tial-Doped A-C:H Films Prepared by Magnetron Sputtering

The Structure, Surface Topography and Mechanical Properties of Si–C–N Films Fabricated by RF and DC Magnetron Sputtering

An investigation of the work function and stability of chromium oxide thin films deposited by reactive magnetron sputtering

Friction and wear of a-C:H films deposited at different bias in air and NaCl solution

Effect of Substrate Bias on the Microstructure and Properties of Non-Equimolar (alcrsitizr)n Films with Different Cr/Zr Ratios Deposited Using Reactive Direct Current Magnetron Sputtering

Structure and Characteristics of Amorphous (ti,si)–c:H Films Deposited by Reactive Magnetron Sputtering

Effect of sputtering power and substrate bias on microstructure, mechanical properties and corrosion behavior of CoCrFeMnNi high entropy alloy thin films deposited by magnetron sputtering method

Microstructure and Surface Properties of Chromium-Doped Diamond-Like Carbon Thin Films Fabricated by High Power Pulsed Magnetron Sputtering