Reactive ion beam etching for diffractive optical elements

Liming Yang,Shuhuan Yu,Qiao Xu,Xiaowu Shu,Guoguang Yang
1998-01-01
Abstract:This paper presents a novel method, Reactive ion Beam Etching ( RIBE ) technique, for fabricating Diffractive Optical Elements (DOEs). The research demonstrates that RIBE technique has many characters,such as high etching rate,good isotropy and flexible etching parameters control. This technique is advantageous for manufacturing fine structures of DOEs and micro-optical elements. The parameters' influences on etching rate are given. This method is used in fabricating DAMMANN Gratings in infrared materials.
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