Analysis of Errors & Calibration Method for Manufacturing Multilevel Diffractive Optical Element by Ion Etching

YQ Fu,ZW Lu,YY Ma,ZC Weng

DOI: https://doi.org/10.1117/12.318298

1998-01-01

Abstract:Fabrication errors and its affecting factors were analyzed for multilevel DOE in this paper. A method of Moire fringe alignment was put forth. it was proved by actual manufacturing that this way is available for aligning positioning error.

What problem does this paper attempt to address?

Analysis of fabrication errors and study of calibration method for multilevel diffractive optical element

Yongqi Fu

1998-01-01

Abstract:The manufacture error of multilevel step diffraction optical element (DOE) consists of positioning error and alignment error, where the alignment error is larger and it affects diffraction efficiency of DOE greatly. Positioning error is the main factor influencing diffraction efficiency in alignment error. A method of Moire fringe alignment was put forth. It has been proved by actual manufacturing that this method is available for aligning positioning error.
Study of Microfabrication and Error Calibration for Multilevel Diffractive Optical Element by Thin Film Deposition

Yong-Qi FU,Jing-Li ZHAO,Ji-Xue LI,Xin ZHANG,Xuan-Ming ZHENG

DOI: https://doi.org/10.3321/j.issn:1004-924X.1999.05.011

1999-01-01

Optics and Precision Engineering

Abstract:Photolithographic patterning and thin fi lm deposition were used for manufacturing multilevel diffractiveoptical element (DOE). Fabrication errors and its affecting factors were analyzed for multilevel DOE in this paper. Calibrationmethod was come up with to modify alignment error. It was proved by actual manufacturing process that this method isavailable for aligning positioning error.
Reactive ion beam etching for diffractive optical elements

Liming Yang,Shuhuan Yu,Qiao Xu,Xiaowu Shu,Guoguang Yang

1998-01-01

Abstract:This paper presents a novel method, Reactive ion Beam Etching ( RIBE ) technique, for fabricating Diffractive Optical Elements (DOEs). The research demonstrates that RIBE technique has many characters,such as high etching rate,good isotropy and flexible etching parameters control. This technique is advantageous for manufacturing fine structures of DOEs and micro-optical elements. The parameters' influences on etching rate are given. This method is used in fabricating DAMMANN Gratings in infrared materials.
Alignment Methods for Micron-Scale Surface Defects Automatic Evaluation of Large-Aperture Fine Optics

Pin Cao,Yongying Yang,Chen Li,Huiting Chai,Yang Li,Shibin Xie,Dong Liu

DOI: https://doi.org/10.3788/col201513.041102

IF: 2.56

2015-01-01

Chinese Optics Letters

Abstract:A surface defect evaluation system can combine microscopic scattering dark-field imaging with sub-aperture scanning and stitching. Thousands of sub-apertures are involved; mechanical errors will cause stitching dislocation, leading to defect cracks. In this Letter, we propose standard line coordinate error adjustment dealing with consistency error between coordinates of the scanning and imaging system, and defocus depth estimation leveling method dealing with high-cleanliness fine optics defocuing caused by the surface which is not perpendicular to microscope’s optical axis. Experiments show defect cracks are effectively solved and the defocus of 420 mm × 420 mm components can be controlled within depth of field 20 μm.
Surface defects evaluation system based on electromagnetic model simulation and inverse-recognition calibration method

Yongying Yang,Huiting Chai,Chen Li,Yihui Zhang,Fan Wu,Jian Bai,Yibing Shen

DOI: https://doi.org/10.1016/j.optcom.2016.12.075

IF: 2.4

2017-01-01

Optics Communications

Abstract:Digitized evaluation of micro sparse defects on large fine optical surfaces is one of the challenges in the field of optical manufacturing and inspection. The surface defects evaluation system (SDES) for large fine optical surfaces is developed based on our previously reported work. In this paper, the electromagnetic simulation model based on Finite-Difference Time-Domain (FDTD) for vector diffraction theory is firstly established to study the law of microscopic scattering dark-field imaging. Given the aberration in actual optical systems, point spread function (PSF) approximated by a Gaussian function is introduced in the extrapolation from the near field to the far field and the scatter intensity distribution in the image plane is deduced. Analysis shows that both diffraction-broadening imaging and geometrical imaging should be considered in precise size evaluation of defects. Thus, a novel inverse-recognition calibration method is put forward to avoid confusion caused by diffraction-broadening effect. The evaluation method is applied to quantitative evaluation of defects information. The evaluation results of samples of many materials by SDES are compared with those by OLYMPUS microscope to verify the micron-scale resolution and precision. The established system has been applied to inspect defects on large fine optical surfaces and can achieve defects inspection of surfaces as large as 850mm×500mm with the resolution of 0.5µm.
Influence of Fabrication Error in Ion Beam Etching on Diffractive Optical Element

LIU Qiang,ZHANG Xiao-bo,WU Rong,TIAN Yang-chao,LI Yong-ping

DOI: https://doi.org/10.3969/j.issn.1003-501x.2007.11.011

2007-01-01

Abstract:According to the technical process of ion beam etching on Diffractive Optical Element (DOE), a distribution of surface error in ion beam etching was presented. The analysis of numerical simulation based on the theory of Fraunhofer of scalar diffraction was discussed. The results of analysis and experiment show that the surface distribution of etching error causes an aberrant spot of intensity obviously in the center of focal area of DOE, which consumedly reduces the uniformity of target field in uniform illumination.
Distortion Correction in Surface Defects Evaluating System of Large Fine Optics

Shitong Wang,Dong Liu,Yongying Yang,Xiaoyu Chen,Lu Li,Lu Yan,Zhongtao Cheng,Yibing Shen

DOI: https://doi.org/10.1016/j.optcom.2013.08.083

IF: 2.4

2014-01-01

Optics Communications

Abstract:It is challenging to quantitate micron-scale defects on the surface of large optics. Based on microscopic scattering dark-field imaging, sub-aperture scanning and stitching, the Surface Defects Evaluating System (SDES) can spot and measure scratch and digs on large optics. In order to evaluate defects of down to sub-micron over apertures of hundreds of millimeters, high magnification zoom microscope and large format CCD camera are employed to balance between the efficiency and resolution. Unfortunately, large optical distortion in the sub-aperture images can be found, and feature recognition of defect images as well as mismatches of the sub-apertures stitching are greatly affected. In this paper, a distortion correction procedure based on the Brown–Conrady model is proposed. Grayscale surface fitting and bilinear interpolation techniques are employed to obtain better correction accuracy. A grids-patterned fused silica standard plate has been specifically made to calibrate the distortion. Comparison experiments indicate that the distortion in the SDES can be corrected by the proposed method very well.
Theory and Method of Microstructure Doe As Substitution for Aspheric Surface

T Ma,GG Yang,J Bai,XY Hou,YB Shen

DOI: https://doi.org/10.1117/12.576251

2005-01-01

Abstract:On the basis of Fresnel diffraction theory, surface microstructure of diffractive optical element (DOE) based on sphere using for aspheric surface was presented in this paper according to the same performance of introducing aspericity into optical system. Spherical DOE uses sphere taking the main focusing power and diffractive microstructure compensating the phase difference from aspheric surface to reference sphere. Thus, spherical DOE has the advantage of avoiding the difficulties of fabrication and measurement of aspheric surface and constructing the DOE microstructure in larger range than the DOE based on planar surface with the limitation of the critical dimension. An important aspect of this method is how to obtain the best fitting reference sphere to aspheric surface. The reference wavelength and the critical dimension were introduced into the limiting condition as the choosing criterion of the best fitting reference sphere. With this method all the lens surface of optical systems can be fabricated as sphere. The theory and method was proved and emulated with computer. Microstructure DOE based on sphere as substitution for aspheric surface is feasible in practice.
Improving Diffraction Efficiency of DOE in Wide Waveband Application by Multilayer Micro-Structure

MA Tao,SHEN Yi-bing,YANG Guo-guang

DOI: https://doi.org/10.3969/j.issn.1007-2276.2008.01.027

2008-01-01

Abstract:According to the disadvantage of single layer diffractive optical element(DOE),a new DOE is introduced.More than two layers of stratified microstructures of different phase heights and dispersive materials are taken into the configuration to increase variable factors of the phase distribution function of multilayer DOE.By controlling the phase modulation of wide waveband to approximate to integer times of 2π,the diffraction efficiency of a double-layer DOE can be greater than 96% in 0.4~0.8 μm visual band.As substitute for fluorite lens,a double-layer DOE is used in a long focal-length apochromatic objective lens.The modulation transfer function(MTF) of this hybrid optical system is suggested for evaluating diffraction efficiency of the multilayer DOE.The results show the diffraction efficiency has a wide and symmetrical distribution in the whole waveband.
Calibration of Etching Uniformity for Large Aperture Multilevel Diffractive Optical Element by Ion Beam Etching

YQ Fu,NKA Bryan,ON Shing

DOI: https://doi.org/10.1063/1.1150374

IF: 1.6

2000-01-01

Review of Scientific Instruments

Abstract:Ion beam milling is a suitable technique for manufacturing optical elements. It has the advantages of accurately controlling and maintaining a constant optical index. However, it is very difficult to ensure etching uniformity on large areas due to the instability of the machine during sputtering. In this article, the etching speed is analyzed, and selection criteria of corresponding technological parameters are proposed. An available calibration method is put forth to improve etching depth uniformity. Etching is divided into several steps and the sample is rotated to change its position on the target after each step. It is proved by experiment that this is very practical for actual fabrication with a 5%–15% improvement of depth uniformity from previous results.
Influences of Misalignment Errors of Optical Components in an Orthogonal Two-Axis Lloyd's Mirror Interferometer.

Yuki Shimizu,Ryo Aihara,Zongwei Ren,Yuan-Liu Chen,So Ito,Wei Gao

DOI: https://doi.org/10.1364/oe.24.027521

IF: 3.8

2016-01-01

Optics Express

Abstract:This paper presents a detailed analysis on the influence of misalignment errors of optical components in an orthogonal two-axis Lloyd's mirror interferometer, which can fabricate two-dimensional grating structures in a single exposure. In an ideal condition, defect-free two-dimensional grating structures can be fabricated by the interferometer. However, in a real case, visible stripes caused by misalignment errors of the optical components in the interferometer always appear on the fabricated grating structures. In this paper, theoretical analysis and experiments are carried out to analyze the influences of the misalignment errors of the optical components in the orthogonal two-axis Lloyd's mirror interferometer.
Digital Calibration Method for Defects Evaluation of Large Fine Optical Surfaces

Xiaoyu Chen,Dong Liu,Yongying Yang,Lu Yan,Lu Li,Pin Cao,Shitong Wang,Yibing Shen

DOI: https://doi.org/10.1117/12.2070598

2014-01-01

Abstract:The digital calibration method, which is employed in the Surface Defects Evaluation System (SDES) for the defects evaluation of large fine optical surfaces, is presented in this paper. A criterion board, which comes from special design and careful fabrication, is employed to relate the dimensions of the defects and those of their images. The calibration procedure, including collecting of calibration images, digital image processing and calibration function fitting, is described in detail in this paper. Calibration experiments on scratch width and dig diameter were carried out at three different microscope magnification conditions. Experiment results show that following the proposed digital calibration method, micron-sized defects distributed sparsely on a large-aperture fine optical surface can be evaluated with micron accuracy and high efficiency.
Impact of fabrication errors and refractive index on multilevel diffractive lens performance

Sourangsu Banerji,Jacqueline Cooke,Berardi Sensale-Rodriguez

DOI: https://doi.org/10.1038/s41598-020-71480-2

2020-09-03

Abstract:Multilevel diffractive lenses (MDLs) have emerged as an alternative to both conventional diffractive optical elements (DOEs) and metalenses for applications ranging from imaging to holographic and immersive displays. Recent work has shown that by harnessing structural parametric optimization of DOEs, one can design MDLs to enable multiple functionalities like achromaticity, depth of focus, wide-angle imaging, etc. with great ease in fabrication. Therefore, it becomes critical to understand how fabrication errors still do affect the performance of MDLs and numerically evaluate the trade-off between efficiency and initial parameter selection, right at the onset of designing an MDL, i.e., even before putting it into fabrication. Here, we perform a statistical simulation-based study on MDLs (primarily operating in the THz regime) to analyse the impact of various fabrication imperfections (single and multiple) on the final structure as a function of the number of ring height levels. Furthermore, we also evaluate the performance of these same MDLs with the change in the refractive index of the constitutive material. We use focusing efficiency as the evaluation criterion in our numerical analysis; since it is the most fundamental property that can be used to compare and assess the performance of lenses (and MDLs) in general designed for any application with any specific functionality.
Role of Fabrication Errors and Refractive Index on Multilevel Diffractive Lens Performance

Sourangsu Banerji,Jacqueline Cooke,Berardi Sensale-Rodriguez

DOI: https://doi.org/10.1038/s41598-020-71480-2

2020-09-11

Abstract:Multilevel diffractive lenses (MDLs) have emerged as an alternative to both conventional diffractive optical elements (DOEs) and metalenses for applications ranging from imaging to holographic and immersive displays. Recent work has shown that by harnessing structural parametric optimization of DOEs, one can design MDLs to enable multiple functionalities like achromaticity, depth of focus, wide-angle imaging, etc. with great ease in fabrication. Therefore, it becomes critical to understand how fabrication errors still do affect the performance of MDLs and numerically evaluate the trade-off between efficiency and initial parameter selection, right at the onset of designing an MDL, i.e., even before putting it into fabrication. Here, we perform a statistical simulation-based study on MDLs (primarily operating in the THz regime) to analyze the impact of various fabrication imperfections (single and multiple) on the final structure as a function of the number of ring height levels. Furthermore, we also evaluate the performance of these same MDLs with the change in the refractive index of the constitutive material. We use focusing efficiency as the evaluation criterion in our numerical analysis; since it is the most fundamental property that can be used to compare and assess the performance of lenses (and MDLs) in general designed for any application with any specific functionality.

Optics
Analysis of the Effects on Ultra-Short Laser Pulse Beam Quality Caused by Errors in Optical Systems

Shang Hong-bo,Cen Zhao-feng,Li Xiao-tong,Liu Qiang-sheng,Hu Wei

DOI: https://doi.org/10.1117/12.866868

2010-01-01

Abstract:The quality of the ultra-short laser pulse need to be controlled in applications. In this paper, the effects on ultra-short laser pulse beam quality caused by surface errors and assembly errors in real optical systems is analyzed in a microscope objective system. Zernike polynomials are used to describe the surface errors and error limit is set for the tilt and decenter in assembly. When coming to calculations, we firstly take samples from the incident laser pulse and decompose it into different frequency components; then we use ray-tracing combing with diffraction integral from the exit pupil to the focal plane for calculation. According to the result of the calculation and analysis, we can reasonably control the surface errors and assembly errors in the microscope object system.
Effects of Fabrication Errors on MTF and Diffraction Efficiency for Binary Optical Lens

Tieqiao Zheng,Xuemin Cheng,Qiaofeng Tan

DOI: https://doi.org/10.1117/12.2505638

2018-01-01

Abstract:Since the performance of binary optical element (BOE) is affected vastly by etching depth error, mask misalignment and feature rounding introduced by the fabrication process, it becomes important to analyze the effects of fabrication errors on the BOE. The phase pattern of binary optical lens will not be symmetrical when the misalignment error exists, and it is very complicate to analyze the diffraction efficiency. Based on the relationship between the diffraction efficiency and the modulation transfer function (MTF), the MTF of a binary optical lens with different fabrication errors is calculated, and the effects on diffraction efficiency are also obtained.
Diffraction Analysis of Sidelobe Characteristics of Optical Elements with Ripple Error

Lei Zhao,Yupeng Luo,Jian Bai,Xiangdong Zhou,Juan Du,Qun Liu,Yujie Luo

DOI: https://doi.org/10.1117/12.2317564

2018-01-01

Abstract:The ripple errors of the lens lead to optical damage in high energy laser system. The analysis of sidelobe on the focal plane, caused by ripple error, provides a reference to evaluate the error and the imaging quality. In this paper, we analyze the diffraction characteristics of sidelobe of optical elements with ripple errors. First, we analyze the characteristics of ripple error and build relationship between ripple error and sidelobe. The sidelobe results from the diffraction of ripple errors. The ripple error tends to be periodic due to fabrication method on the optical surface. The simulated experiments are carried out based on angular spectrum method by characterizing ripple error as rotationally symmetric periodic structures. The influence of two major parameter of ripple including spatial frequency and peak-to-valley value to sidelobe is discussed. The results indicate that spatial frequency and peak-to-valley value both impact sidelobe at the image plane. The peak-to-valley value is the major factor to affect the energy proportion of the sidelobe. The spatial frequency is the major factor to affect the distribution of the sidelobe at the image plane.
Research On A New Approach For The Fabrication Of Diffractive Optical Elements By Means Of Rotating Digital Mask

Q Jin,Yq Gao,Nn Luo,Jw Hu

2005-01-01

Abstract:An approach, used to fabricate diffractive optical elements (DOEs), is presented by applying reduction projecting system based on digital micro-mirror device (DMD)([1][2]) and digital mask technique([3]) The accumulation of exposure energy can be obtained through modulating rotating velocity of mask graphics, and finally distribution of exposure, which is required, can be achieved. It shows that the method is Practical and feasible on the grounds of the results of MATLAB simulation and experiments. The fabricated DOE has the same structure as the Fresnel lens. The method avoids the mechanical alignment error and mismachining tolerance, and improves efficiency of DOEs fabrication, in addition, it can low the manufacture cost.
Methods for increasing the etching uniformity of ion beam multiple mask

Xiaobo Zhang,Ying Xiong,Qiang Liu,Yangchao Tian

DOI: https://doi.org/10.1117/12.830822

2009-01-01

Abstract:With uniform illumination, multi-step diffractive optical elements (DOE) are fabricated with ion beam multiple mask etching technology. According to the technical process of ion beam multiple mask etching on DOE, a distribution of surface error based on LKJ-150 ion beam etching machine is presented. Numerical analysis indicates that the surface distribution of etching error results in lower performance of multi-step DOE, which consumedly reduces the uniformity of target field with uniform illumination. After each etching process, the sample i.e, multi-step DOE fabricated by LKJ-150 ion beam etching machine is measured. Through measurement data, we get the etching error. On the basis of etching error , the mask can be made. Numerical analysis shows this method can reduce the impact of surface error on the performance of DOE and increase the etching uniformity of. ion beam multiple mask. © 2009 SPIE.
The Influence of Fabrication Error in Ion Beam Rotation Etching on Uniform Illumination

徐俊中,赵逸琼,王炜,李永平,徐向东,周洪军,洪义麟,李涛,傅绍军

DOI: https://doi.org/10.3969/j.issn.1003-501X.2001.06.007

2001-01-01

Abstract:An ion beam rotation etching technique used for manufacture of diffractive optical elements with continuous relief structure is introduced in the paper. The simulation calculation for the influence of ion beam non-uniformity in the technological system and the alignment error between substrate and mask center on device properties is carried out. The process improvement scheme is proposed according to the simulation analysis for errors.

Analysis of Errors & Calibration Method for Manufacturing Multilevel Diffractive Optical Element by Ion Etching

Analysis of fabrication errors and study of calibration method for multilevel diffractive optical element

Study of Microfabrication and Error Calibration for Multilevel Diffractive Optical Element by Thin Film Deposition

Reactive ion beam etching for diffractive optical elements

Alignment Methods for Micron-Scale Surface Defects Automatic Evaluation of Large-Aperture Fine Optics

Surface defects evaluation system based on electromagnetic model simulation and inverse-recognition calibration method

Influence of Fabrication Error in Ion Beam Etching on Diffractive Optical Element

Distortion Correction in Surface Defects Evaluating System of Large Fine Optics

Theory and Method of Microstructure Doe As Substitution for Aspheric Surface

Improving Diffraction Efficiency of DOE in Wide Waveband Application by Multilayer Micro-Structure

Calibration of Etching Uniformity for Large Aperture Multilevel Diffractive Optical Element by Ion Beam Etching

Influences of Misalignment Errors of Optical Components in an Orthogonal Two-Axis Lloyd's Mirror Interferometer.

Digital Calibration Method for Defects Evaluation of Large Fine Optical Surfaces

Impact of fabrication errors and refractive index on multilevel diffractive lens performance

Role of Fabrication Errors and Refractive Index on Multilevel Diffractive Lens Performance

Analysis of the Effects on Ultra-Short Laser Pulse Beam Quality Caused by Errors in Optical Systems

Effects of Fabrication Errors on MTF and Diffraction Efficiency for Binary Optical Lens

Diffraction Analysis of Sidelobe Characteristics of Optical Elements with Ripple Error

Research On A New Approach For The Fabrication Of Diffractive Optical Elements By Means Of Rotating Digital Mask

Methods for increasing the etching uniformity of ion beam multiple mask

The Influence of Fabrication Error in Ion Beam Rotation Etching on Uniform Illumination