Laser stage system for sub-micron E-beam exposure machine

Yeyi Liu,Tong Tian,Jin Qian
1998-01-01
Abstract:A laser stage system for sub-micron E-beam exposure machine which is being applied to the field at present was introduced. Its technical characteristics were described in detail, the error factors affecting the repeated measuring accuracy were analyzed, the technical specifications which have been attained in practical testing were given.
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