Abstract:Poly(methylmethacrylate) (PMMA) has been widely used in the fields of optical instruments, aviation and auto industry, construction industry, advertising and decoration industry due to its optical transparency, low cost, low toxicity, and less fragile property. Recently it has been exploited to fabricate microfluidic chips. Region-selective metallization of PMMA surfaces are frequently required to improve the surface properties of PMMA and to integrate micro metal devices in PMMA microfluidic chips. This article presents our recent study on region-selective metalization of PMMA by means of UV/O-3-based surface modification in combination of region-selective electroless plating. Deep UV-lights, ozone, and deep UV-lights in cooperation with ozone were compared with respect to the efficiency of hydrophilization of the PMMA surface. It was observed with water contact angle measurements that only synchronized deep UV and ozone treatment can turn the PMMA surface from hydrophobic to hydrophilic effectively. Attenuated total reflection fourier transform infrared spectra revealed that polar moieties such as carboxyl groups were generated on the UV/O-3 treated areas. These polar moieties served as the anchors for further chemical reactions including amination of the carboxyl groups with ethylenediamine, adsorption of chloraurate anion onto the amine groups, and reduction of the Au(III) in the chloraurate anion to Au(0) by borohydride. These reactions led to the formation of the catalysis center of gold nano-particles on the UV-irradiated areas, which is indispensable for region-selective electroless plating. After optimization of the experimental conditions, a novel method for preparation of micro metal devices on PMMA surface has been established. With the printed poly(ethylene terephthalate) (PET) film serving as the primary photo mask, the achievable resolution of the prepared micro metal patterns was 50 mu m or less. The deposited metal films adhered to the PMMA surface so strongly that they could hardly be tore off with adhesive tapes. Micro gold electrodes, micro gold electric heaters, micro copper electrodes, etc. were demonstrated to be prepared on PMMA surfaces, and their physical and electro-chemical properties were characterized.

Study on preparation of ultrathin PMMA resist by Langmuir Blodgett technique

Langmuir-Blodgett resist films for microlithography by exposure to a scanning electron microscope

Ultrathin Resist Films Patterning Using a Synchrotron Radiation Lithography System

Rapid Prototyping of Soft Lithography Masters for Microfluidic Devices Using Dry Film Photoresist in a Non-Cleanroom Setting

Photolithography Using Lateral Surface of Nanofibers

Fabrication of 1-d nanochannels on PMMA substrate by photoresist-free uv lithography and UV-assisted bonding under low temperature

Superiority of Langmuir-Blodgett resist films in electron beam lithography as demonstrated by the backscattering yield

PMMA resist profile and proximity effect dependence on the electron-beam lithography process parameters

A Novel Pmma/Neb Bilayer Process for Sub-20 Nm Gold Nanoslits by A Selective Electron Beam Lithography and Dry Etch

An automatic Langmuir-Blodgett system based on flowing subphase compression

Fabrication of Fluidic Chips with 1-D Nanochannels on PMMA Substrates by Photoresist-Free UV-lithography and UV-assisted Low-Temperature Bonding

Region-selective Metalization of Poly(methylmethacrylate) Surface Based on UV/ozone Surface Modification

Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting

Recent progress in non-photolithographic patterning of polymer thin films

Quantitative evaluation of residual resist in electron beam lithography based on scanning electron microscopy imaging and thresholding segmentation algorithm

Manipulation Of Nanoscale Phase Separation And Optical Properties Of P3ht/Pmma Polymer Blends For Photo Luminescent Electron Beam Resist

An Investigation of the Backscattering Yield of Langmuir-Blodgett Resist Films in Electron-Beam Lithography

High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐b‐PMMA Block Copolymer Nanomasks during Mask Development

Effect of Metal Oxide Deposition on the Sensitivity and Resolution of E-Beam Photoresist

Advanced nano-lithography technology

Fabrication and characterization of stable ultrathin film micropatterns containing DNA and photosensitive polymer diazoresin