Fabrication and characterization of stable ultrathin film micropatterns containing DNA and photosensitive polymer diazoresin

Bing Yu,Hai–Lin Cong,Hu–Wei Liu,Cong-Hua Lu,Fang Wei,Wei-Xiao Cao
DOI: https://doi.org/10.1007/s00216-005-0229-9
2005-01-01
Analytical and Bioanalytical Chemistry
Abstract:Stable, ultrathin DNA micropatterns were fabricated from photosensitive polymer diazoresin (DR) through a self-assembly technique. The micropatterns were achieved on LBL ultrathin film after UV exposure through a photomask. The patterns were characterized systematically with scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy and fluorescence microscopy. All of the results indicate that the combined LBL self-assembly and photolithography technique is a promising method for constructing stable, well-defined micropatterns with a nanoscale thickness.
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