Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Fabrication and Characterization of Stable Ultrathin Film Micropatterns Containing CdS Nanoparticles

Au Nanoparticle Micropatterns Prepared from Self-Assembled Films

Fabrication and characterization of stable ultrathin film micropatterns containing DNA and photosensitive polymer diazoresin

Fabrication of Integrated Patterns Using Lithography and Particles Assembling Techniques

Facile Approach to the Fabrication of a Micropattern Possessing Nanoscale Substructure

Fabrication of Ultrathin Films of CdTe Quantum Dots by Electrostatic Self-assembly Method

Superhydrophilic–superhydrophobic Micropattern on TiO2 Nanotube Films by Photocatalytic Lithography

Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography.

Patterning Submicrometer Thick Inorganic Nanoparticle Films by Solution Process and Application for Light Trapping in Solar Cells

Nonlithographic Fabrication of Nanostructured Micropatterns Via Breath Figures and Solution Growth

Fabrication of CdS Micropatterns: Effects of Intermolecular Hydrogen Bonding and Decreasing Capping Ligand

Light Patterning Semiconductor Nanoparticles by Modulating Surface Charges

Micro/Nanoscale Structure Fabrication by Direct Nanoimprinting of Metallic and Semiconducting Nanoparticles

Particle Lithography-Based Patterning of Polyelectrolyte Template Films and Their Application in Fabrication of Gold/silver Nanoparticle Assembly.

Tailoring Two-Dimensional Nanoparticle Arrays into Various Patterns

Patterned carbon nanotubes fabricated by the combination of microcontact printing and diblock copolymer micelles.

Creation of cadmium sulfide nanostructures using AFM dip-pen nanolithography.

Unconventional Lithography for Patterned Nanomaterials

Patterning Nanoparticles by Microcontact Printing and Further Growth of One-Dimensional Nanomaterials

Ultrafast Fabrication of Large‐Area Colloidal Crystal Micropatterns Via Self‐Assembly and Transfer Printing