Abstract:Conducting polymers have attracted great attention since the discovery of high conductivity in doped polyacetylene in 1977(1). They offer the advantages of low weight, easy tailoring of properties and a wide spectrum of applications(2,3). Due to sensitivity of conducting polymers to environmental conditions (e.g., air, oxygen, moisture, high temperature and chemical solutions), lithographic techniques present significant technical challenges when working with these materials(4). For example, current photolithographic methods, such as ultra-violet (UV), are unsuitable for patterning the conducting polymers due to the involvement of wet and/or dry etching processes in these methods. In addition, current micro/nanosystems mainly have a planar form(5,6). One layer of structures is built on the top surfaces of another layer of fabricated features. Multiple layers of these structures are stacked together to form numerous devices on a common substrate. The sidewall surfaces of the microstructures have not been used in constructing devices. On the other hand, sidewall patterns could be used, for example, to build 3-D circuits, modify fluidic channels and direct horizontal growth of nanowires and nanotubes. A macropunching method has been applied in the manufacturing industry to create macropatterns in a sheet metal for over a hundred years. Motivated by this approach, we have developed a micropunching lithography method (MPL) to overcome the obstacles of patterning conducting polymers and generating sidewall patterns. Like the macropunching method, the MPL also includes two operations (Fig. 1): (i) cutting; and (ii) drawing. The "cutting" operation was applied to pattern three conducting polymers(4), polypyrrole (PPy), Poly(3,4-ethylenedioxythiophen)-poly(4-styrenesulphonate) (PEDOT) and polyaniline (PANI). It was also employed to create Al microstructures(7). The fabricated microstructures of conducting polymers have been used as humidity(8), chemical(8), and glucose sensors(9). Combined microstructures of Al and conducting polymers have been employed to fabricate capacitors and various heterojunctions(9,10,11). The "cutting" operation was also applied to generate submicron-patterns, such as 100- and 500-nm-wide PPy lines as well as 100-nm-wide Au wires. The "drawing" operation was employed for two applications: (i) produce Au sidewall patterns on high density polyethylene (HDPE) channels which could be used for building 3D microsystems(12,13,14), and (ii) fabricate polydimethylsiloxane (PDMS) micropillars on HDPE substrates to increase the contact angle of the channel(15).

Micropatterning of Conducting Polymer Thin Films on Reactive Self-assembled Monolayers

Recent progress in non-photolithographic patterning of polymer thin films

Direct Patterning of Poly(p-phenylene Vinylene) Thin Films Using Microcontact Printing

Π-Conjugated Microporous Polymer Films: Designed Synthesis, Conducting Properties, and Photoenergy Conversions

Electrostatic layer-by-layer nano-assembly: films, cantilevers, micropatterns, and nanocapsules

Multifunctional Photodegradable Polymers for Reactive Micropatterns

A Simple Method to Fabricate A Conductive Polymer Micropattern on an Organic Polymer Substrate

Micropatterns of Protein and Conducting Polymer Molecules Fabricated by Layer-by-Layer Self-Assembly and Photolithography Techniques

Micropunching lithography for generating micro- and submicron-patterns on polymer substrates

Controlled Synthesis of Conjugated Microporous Polymer Films: Versatile Platforms for Highly Sensitive and Label‐Free Chemo‐ and Biosensing

Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting

A Microcontact Printing Induced Supramolecular Self-Assembled Photoactive Surface for Patterning Polymer Brushes

Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography.

Well-defined micropatterns of polymers prepared by controlled crystallization process

Design of Highly Photofunctional Porous Polymer Films with Controlled Thickness and Prominent Microporosity

Micropattern Fabricated by Acropetal Migration Controlled through Sequential Photo and Thermal Polymerization

Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

Layer-by-Layer Self-Assembly of Reactive Polyelectrolytes for Robust Multilayer Patterning

Continuous and Patterned Conducting Polymer Coatings on Diverse Substrates: Rapid Fabrication by Oxidant-Intermediated Surface Polymerization and Application in Flexible Devices

Multilayer Assembly and Patterning of Poly(p-phenylenevinylene)s Via Covalent Coupling Reactions

Stepwise Aggregation Control of PEDOT:PSS Enabled High-Conductivity, High-Resolution Printing of Polymer Electrodes for Transparent Organic Phototransistors