Ion Neutralization at an Si- or Ge-type Semiconductor Surface

GH WEI,ZX YANG,XQ DAI,SY WEI,M WANG,T ZHANG
DOI: https://doi.org/10.1088/0953-8984/6/27/008
1994-01-01
Abstract:The approximate many-level method is used to study ion neutralization near the surface of an Si- or Ge-type semiconductor. The tight-binding approximation is employed to model the semiconductor as a one-dimensional chain of sp hybrids. Calculations show that the electronic structure and the component of the substrate surface, by introducing the surface density, play important roles in the ion resonance charge transfer.
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