Discrimination of Dislocations in 4H-Sic by Inclination Angles of Molten-Alkali Etched Pits
Guang Yang,Hao Luo,Jiajun Li,Qinqin Shao,Yazhe Wang,Ruzhong Zhu,Xi Zhang,Lihui Song,Yiqiang Zhang,Lingbo Xu,Can Cui,Xiaodong Pi,Deren Yang,Rong Wang
DOI: https://doi.org/10.1088/1674-4926/43/12/122801
2022-01-01
Journal of Semiconductors
Abstract:Discrimination of dislocations is critical to the statistics of dislocation densities in 4H silicon carbide(4H-Si C), which are routinely used to evaluate the quality of 4H-Si C single crystals and homoepitaxial layers. In this work, we show that the inclination angles of the etch pits of molten-alkali etched 4H-Si C can be adopted to discriminate threading screw dislocations(TSDs),threading edge dislocations(TEDs) and basal plane dislocations(BPDs) in 4H-Si C. In n-type 4H-Si C, the inclination angles of the etch pits of TSDs, TEDs and BPDs in molten-alkali etched 4H-Si C are in the ranges of 27°-35°, 8°-15° and 2°-4°, respectively. In semi-insulating 4H-Si C, the inclination angles of the etch pits of TSDs and TEDs are in the ranges of 31°-34° and 21°-24°, respectively. The inclination angles of dislocation-related etch pits are independent of the etching duration, which facilitates the discrimination and statistic of dislocations in 4H-Si C. More significantly, the inclination angle of a threading mixed dislocations(TMDs)is found to consist of characteristic angles of both TEDs and TSDs. This enables to distinguish TMDs from TSDs in 4H-Si C.