Pressure controlled tunable magnetic, electrical and optical properties of (Cu, Li)-codoped ZnO thin films

Liqiang Zhang,Bin Lu,Zhizhen Ye,Jianguo Lu,Jingyun Huang
DOI: https://doi.org/10.1016/j.ssc.2013.07.025
IF: 1.934
2013-01-01
Solid State Communications
Abstract:Zn0.989Cu0.01Li0.001O thin films have been deposited on c-plane sapphire substrates by pulsed laser deposition (PLD). The films deposited at 500°C and the oxygen pressures (PO2) ranging from 0.04 to 40Pa were of good crystallinity with a (0002) preferential orientation. Three conductivity regimes were observed for the films with varying the PO2. The n-type film obtained at 0.04Pa had a low resistivity of 1.95×10−2Ωcm, Hall mobility of 14.8cm2V−1s−1, and carrier concentration of 2.16×1019cm−3. The p-type Zn0.989Cu0.01Li0.001O film could achieve when oxygen ambient reached as high as 40Pa and with a hole concentration of 1.12×1018cm−3. Films grown at PO2 between 0.4 and 4Pa commonly exhibited insulating behavior. All the Zn0.989Cu0.01Li0.001O films had a high transmittance above 80% in visible regions and the red-shift in optical band gap (Eg) happened as the PO2 increased. Magnetic measurements showed that only the film fabricated at 0.04Pa with n-type conduction exhibited room temperature ferromagnetism (RTFM) of 0.25μB/Cu while others obtained at higher PO2 were paramagnetic. Oxygen vacancies (VO) are speculated that would play a crucial role for the ferromagnetic behavior observed.
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