Deposition of ZrNxOy films by filtered cathodic vacuum arc

Yiming Chen,Haiqiang Zhang,Z. W. Li,W. Cao,B. Liao,Xu Zhang
DOI: https://doi.org/10.1179/1743294413Y.0000000163
IF: 2.451
2013-01-01
Surface Engineering
Abstract:Zirconium oxynitride (ZrNxOy) thin films were prepared by filtered cathodic vacuum arc technique using N-2/O-2 mixtures. The effect of N-2/O-2 ratios on the microstructure, optical and mechanical properties of films had been investigated. X-ray diffraction results showed that o-Zr3N4(O) phase was observed at low oxygen flowrate, while tetragonal and monoclinic phases of ZrO2 were detected at high one. Optical test revealed that the films changed from semitransparent to transparent, and the absorption edge shifted to lower wavelength with the increase in oxygen flowrate. The refractive indexes of films ranged from 2.24 to 3.47, and the optical band gap increased from 2.06 to 4 eV with the increasing oxygen content, which implied that the films had potentials in optoelectronic applications.
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