Abstract:The present work is essentially focused on the study of optical and structural properties of hydrogenated amorphous silicon thin films (a-Si:H) prepared by radio-frequency cathodic sputtering. We examine separately the influence of hydrogen partial pressure during film deposition, and the effect of post-deposition thermal annealings on the main optical characteristics of the layers such as refraction index, optical gap and Urbach energy. Using the grazing X-rays reflectometry technique, thin film structural properties are examined immediately after films deposition as well as after surface oxidation or annealing. We show that low hydrogen pressures allow a saturation of dangling bonds in the layers, while high doses lead to the creation of new defects. We show also that thermal annealing under moderate temperatures improves the structural quality of the deposited layers. For the films examined just after deposition, the role of hydrogen appears in the increase of their density. For those analysed after a short stay in the ambient, hydrogen plays a protective role against the oxidation of their surfaces. This role disappears for a long time stay in the ambient. Keywords Amorphous silicon, Grazing incidence X-rays, Hydrogen, Optical properties, Penetration depth, Reflectometry, Thermal annealing, Thin films. PACS Numbers 61.10.K - 61.43.D - <a class="link-external link-http" href="http://68.55.JK" rel="external noopener nofollow">this http URL</a> - 68.55.81.15.A

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<title>Structural ordering in amorphous silicon thin film due to post hydrogen plasma annealing</title>

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