Abstract:(TiVCrNbSiTaBY)N high entropy alloy nitride (HEAN) coatings have been deposited onto Si (100) and cemented carbide substrates by radio frequency magnetron sputtering. The deposition is carried out at different bias voltages to study its influence on microstructure, morphology, mechanical properties and tribological behaviour of the coatings. Grazing Incidence X-Ray Diffraction (GIXRD) technique shows that all coatings exhibit single NaCl-type face-centered cubic (FCC) crystal structure, while the preferred orientation of the crystal structure is greatly affected by the bias voltages. High resolution transmission electron microscopy (TEM) reveals that the structure of the coatings is a mixture of amorphous-like phase and FCC crystal structure, which is in agreement with GIXRD data. Cross-sectional Scanning Electron Microscopy (SEM) images exhibit that the columnar structure of the coatings gradually transforms into a featureless dense structure with the increase of bias voltage. SEM and Atomic Force Microscopy reveal that the surface morphology become smoother with increasing bias voltage. The (TiVCrNbSiTaBY)N HEAN coating deposited at a specific bias voltage exhibit a high hardness of 32.2 GPa. The friction coefficient is significantly influenced by the variation of the coatings surface roughness. Tribological tests for coating deposited without and at low bias voltage show that the wear behavior of the coatings is severe abrasive wear and adhesive wear, while at high bias voltage the slight abrasive wear appears. By applying the substrate bias voltage, the (TiVCrNbSiTaBY)N coatings exhibit excellent mechanical and tribological performance, which can be a promising candidate for protective coating in cutting tools or components.

Effects of Negative Substrate Bias Voltage on the Structure and Properties of Aluminum Oxide Films Prepared by DC Reactive Magnetron Sputtering

Effects of substrate bias voltage on the critical failure load of Cr-Al-N coatings

Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO2 Thin Films Grown by DC Reactive Magnetron Sputtering

Influences of Bias Voltage on Mechanical and Tribological Properties of Ti–Al–C Films Synthesized by Magnetron Sputtering

The Effect of Applied Substrate Negative Bias Voltage on the Structure and Properties of Al-containing A-C:H Thin Films

Effects of Negative Bias on the Structural, Topological and Tribological Properties of Amorphous Carbon Films Prepared by Magnetron Sputtering

Effects of Substrate Bias on Structure and Mechanical Properties of (alcrnbsitiv)n Coatings

Effects of Substrate Bias on Structure and Mechanical Properties of Alcrtiwnbta Coatings

Effects of Bias Voltage on Structure and Properties of Tial-Doped A-C:H Films Prepared by Magnetron Sputtering

Effect of Substrate Bias on the Microstructure and Properties of Non-Equimolar (alcrsitizr)n Films with Different Cr/Zr Ratios Deposited Using Reactive Direct Current Magnetron Sputtering

The Influences of High Energetic Oxygen Negative Ions and Active Oxygen on the Microstructure and Electrical Properties of ZnO:Al Films by MF Magnetron Sputtering

The Effects of Na2WO4 Concentration on the Properties of Microarc Oxidation Coatings on Aluminum Alloy

Effects of the negative bias voltages and post-annealing process on the crystallization and martensite formation of Ti-Zr-Hf-Co-Ni-Cu high-entropy thin film

Effect of sputtering condition on dielectric strength and deposition rate of Al2O3 thin film

Influence of DC bias on corrosion resistance of vanadium films on aluminum fabricated by high power pulsed magnetron sputtering method

Effect of bias voltage and nitrogen content on the morphological, structural, mechanical, and corrosion resistance properties of micro-alloyed Ti1−xAl0.8xP0.2XNy films deposited by high power impulse magnetron sputtering

Microstructure, Mechanical and Tribological Properties of Si and Al Co-Doped Hydrogenated Amorphous Carbon Films Deposited at Various Bias Voltages

Effects of bias voltage on the microstructure and properties of AlCrN/AlTiN nanoscale multilayer coatings

Effect of Substrate Bias on the Structure and Properties of Multi-Element (alcrtatizr)n Coatings

Effect of substrate bias on the microstructure and mechanical and tribological properties of ZrNbTiMo refractory high entropy alloy film

Effect of bias voltages on microstructure and properties of (TiVCrNbSiTaBY)N high entropy alloy nitride coatings deposited by RF magnetron sputtering