Mutually Beneficial Doping of Tellurium and Nitrogen in ZnO Films Grown by Metal-Organic Chemical Vapor Deposition

Kun Tang,Shulin Gu,Jiandong Ye,Shunming Zhu,Shimin Huang,Ran Gu,Rong Zhang,Yi Shi,Youdou Zheng
DOI: https://doi.org/10.1116/1.4738949
2012-01-01
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Abstract:The advantages of tellurium-nitrogen (Te-N) codoping are investigated in ZnO films grown by metal-organic chemical vapor deposition. Te incorporation gives aid in enhancing the N solubility by lowering its formation energy while N addition helps to stabilize the substituted Te on O sites with the phase-segregated ZnTe crystallites suppressed by forming the N-Zn-Te structures in the N-doped ZnTexO1−x. Carbon related impurities, commonly existing in N-doped ZnO and acting as compensating centers for holes, are fully eliminated by the Te-N codoping. The codoping technique also lowers the energy level of the NO acceptors and leads to realizing N-doped ZnTexO1−x films with holes as major carriers.
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