Structural and optical properties of heteroepitaxial beta Ga 2O 3 films grown on MgO (100) substrates

Lingyi Kong,Jin Ma,Caina Luan,Wei Mi,Yu Lv
DOI: https://doi.org/10.1016/j.tsf.2012.02.027
IF: 2.1
2012-01-01
Thin Solid Films
Abstract:Gallium oxide (Ga2O3) films were deposited on MgO (100) substrates by metalorganic vapor phase epitaxy. Structure analyses showed that the films deposited at 550–700°C were epitaxial β-Ga2O3 films with an out of plane relationship of β-Ga2O3(100)||MgO(100). The film deposited at 650°C showed the best crystallinity and the microstructure of the film was investigated by high resolution transmission electron microscopy. A theoretical model of the growth mechanism was proposed and the in-plane epitaxial relationship was given to be β-Ga2O3[001]||MgO<011>. A four-domain structure inside the epitaxial film was clarified. The β-Ga2O3 film deposited at 650°C showed an absolute average transmittance of 95.9% in the ultraviolet and visible range, which had an optical band gap of 4.87eV.
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