Investigation of Β-Ga 2 O 3 Films and Β-Ga 2 O 3 /gan Heterostructures Grown by Metal Organic Chemical Vapor Deposition

YaChao Zhang,YiFan Li,ZhiZhe Wang,Rui Guo,ShengRui Xu,ChuanYang Liu,ShengLei Zhao,JinCheng Zhang,Yue Hao
DOI: https://doi.org/10.1007/s11433-019-1546-3
2020-01-01
Science China Physics Mechanics and Astronomy
Abstract:In this work,(-201) β-Ga 2 O 3 films are grown on GaN substrate by metal organic chemical vapor deposition(MOCVD). It is revealed that the β-Ga 2 O 3 film grown on GaN possesses superior crystal quality, material homogeneity and surface morphology than the results of common heteroepitaxial β-Ga 2 O 3 film based on sapphire substrate. Further, the relevance between the crystal quality of epitaxial β-Ga 2 O 3 film and the β-Ga 2 O 3 /GaN interface behavior is investigated. Transmission electron microscopy result indicates that the interface atom refactoring phenomenon is beneficial to relieve the mismatch strain and improve the crystal quality of subsequent β-Ga 2 O 3 film. Moreover, the energy band structure of β-Ga 2 O 3 /GaN heterostructure grown by MOCVD is investigated by X-ray photoelectron spectroscopy and a large conduction band offset of 0.89 eV is obtained. The results in this work not only convincingly demonstrate the advantages of β-Ga 2 O 3 films grown on GaN substrate, but also show the great application potential of MOCVD β-Ga 2 O 3 /GaN heterostructures in microelectronic applications.
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