Study of β-Ga2O3 films hetero-epitaxially grown on off-angled sapphire substrates by halide vapor phase epitaxy

Wanli Xu,Jiacheng Shi,Yuewen Li,Xiangqian Xiu,Shan Ding,Zili Xie,Tao Tao,Peng Chen,Bin Liu,Rong Zhang,Youdou Zheng
DOI: https://doi.org/10.1016/j.matlet.2021.129411
IF: 3
2021-04-01
Materials Letters
Abstract:<p>The heteroepitaxial β-Ga<sub>2</sub>O<sub>3</sub> films were grown on the (0001) sapphire substrates with various off-angles toward &lt;11<span class="math"><math>2-</math></span>0&gt; by halide vapor phase epitaxy (HVPE). The effects of off-angled substrates on the surface morphologies and crystal quality of as-grown β-Ga<sub>2</sub>O<sub>3</sub> films were systematically investigated. The results indicated that the surface morphologies and crystal quality of β-Ga<sub>2</sub>O<sub>3</sub> films grown on the off-angled sapphire substrates were effectively improved, compared with that of the films grown on (0001) sapphire. The quadrilateral domains growth mode was observed by scanning electron microscope and X-ray diffraction φ-scans of as-grown β-Ga<sub>2</sub>O<sub>3</sub> films. When the off-angle of (0001) sapphire substrate was ∼7°, β-Ga<sub>2</sub>O<sub>3</sub> films exhibited the flatter surface morphology and the better crystal-quality. The results would be helpful for the hetero-epitaxy of high-quality Ga<sub>2</sub>O<sub>3</sub> films with smooth surface.</p>
materials science, multidisciplinary,physics, applied
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