Growth of Β-Ga 2 O 3 Films on Sapphire by Hydride Vapor Phase Epitaxy

熊泽宁,修向前,李悦文,华雪梅,谢自力,陈鹏,刘斌,韩平,张荣,郑有炓
DOI: https://doi.org/10.1088/0256-307x/35/5/058101
2018-01-01
Abstract:Two-inch Ga 2 O 3 films with(ˉ201)-orientation are grown on c-sapphire at 850–1050°C by hydride vapor phase epitaxy. High-resolution x-ray diffraction shows that pure β-Ga 2 O 3 with a smooth surface has a higher crystal quality, and the Raman spectra reveal a very small residual strain in β-Ga 2 O 3 grown by hydride vapor phase epitaxy compared with bulk single crystal. The optical transmittance is higher than 80% in the visible and near-UV regions, and the optical bandgap energy is calculated to be 4.9 e V.
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