Investigation on High Quality Ultra-Wide Band Gap Β-Ga2o3/aln Heterostructure Grown by Metal Organic Chemical Vapor Deposition

Yifan Li,Yachao Zhang,Jincheng Zhang,Tao Zhang,Shengrui Xu,Lansheng Feng,Qian Feng,Chunfu Zhang,Yue Hao
DOI: https://doi.org/10.1088/1361-6641/ac7fb4
IF: 2.048
2022-01-01
Semiconductor Science and Technology
Abstract:beta-Ga2O3 films were grown on AlN templates by metal organic chemical vapor deposition (MOCVD), and the properties of the beta-Ga2O3/AlN heterostructures were investigated in detail. The beta-Ga2O3/AlN heterostructure with abrupt interface was observed by the high resolution transmission electron microscope with high angle annular dark field. The refactor of the atoms at the interface is discussed. Moreover, the band structure of the MOCVD beta-Ga2O3/AlN heterostructures was investigated by x-ray photoelectron spectroscopy. The conduction band and valence band offsets of beta-Ga2O3/AlN heterostructure were calculated to be -1.44 eV +/- 0.05 eV and -0.14 eV +/- 0.05 eV, respectively.
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