Integration And Electrical Properties Of Epitaxial Linbo3 Ferroelectric Film On N-Type Gan Semiconductor

Lanzhong Hao,Jun Zhu,Yunjie Liu,Shuili Wang,Huizhong Zeng,Xiuwei Liao,Yingying Liu,Huawei Lei,Ying Zhang,Wanli Zhang,Yanrong Li

DOI: https://doi.org/10.1016/j.tsf.2011.10.048

IF: 2.1

2012-01-01

Thin Solid Films

Abstract:LiNbO3 (LNO) films were epitaxially grown on n-type GaN templates using pulsed laser deposition technique. The microstructures and electrical properties of the LNO/GaN heterostructure were characterized by x-ray diffraction, transmission electron microscope, and capacitance-voltage (C-V) measurements. The LNO films had two variants of grains rotated 60 degrees in-plane to each other. The epitaxial relationship of the respective variants could be built as [10-10]LNO//[1-210]GaN and [1-100]LNO//[11-20]GaN via 30 degrees in-plane rotation of the LNO film relative to the GaN layer. Interface analysis of the heterostructure demonstrated that two different epitaxial growth mechanisms vertical heteroepitaxy and lateral homoepitaxy, should happen at the interface of LNO/GaN. Counterclockwise C-V windows induced by the ferroelectric polarizations of LNO film could be observed clearly. The size of the window increased with increasing the sweep bias and a large window of 5.8 V was achieved at +/- 15 V. By solving Poisson and drift-diffusion equations, the physical mechanisms of the C-V characteristics were demonstrated. (C) 2011 Elsevier B.V. All rights reserved.