The research of the C-doped TiO2 films deposited by arc ion plating

Shujuan Zhang,Mingsheng Li,Zhiqin Chen,Yongzhong Fan

DOI: https://doi.org/10.4028/www.scientific.net/AMM.182-183.292

2012-01-01

Applied Mechanics and Materials

Abstract:The uniform and transparent C-doped TiO2 thin films were successfully deposited on medical glass slide by arc ion plating. The influences of the C-doped quantity, pulsed negative bias and annealing treatment on films properties were investigated. Film structure, surface morphologies and optical properties were measured with XRD, SEM and UV-VIS transmittance spectroscope. Photo-catalytic performance of the films was evaluated by degrading methyl orange. The results show that the C-doped quantity and annealing treatment have important influence on the absorption edges. The effect of annealing treatment is similar to that of the increasing the C-doped quantity, and they can enhance the C doping and extends the absorption edge. The absorption edges of the films increase with the rising of the C-doped quantity, and all the films absorption edges increase after annealing at 400°C for 4h, and the best extending can increase 20nm after annealing. Along with the negative bias increasing, the intensity of rutile diffraction peak increases, but the anatase decreases. The micro-morphology and crystal structure of different C-doped quantity are mutually correspond. The roughness and grain size of TiO2 films surface decreases significantly with the negative bias increasing. The crystal grains become even and fine, the high bias films surface micro-morphology has rice-like granular shape. © (2012) Trans Tech Publications, Switzerland.