SURFACE PASSIVATION OF THERMAL OXIDATION OF SiO2 FILM ON INFLUENCE TO PERFORMANCE OF CRYSTALLINE SILICON SOLAR CELLS

Famin Ye,Shimeng Feng,Aijuan Guo,Shenghu Xiong
DOI: https://doi.org/10.3969/j.issn.0254-0096.2012.02.017
2012-01-01
Abstract:The article focus on the research about the surface passivation by means of dry-oxygen thermal oxidation to grow a SiO 2 film on the surface of crystalline silicon cells. The experimental result shows that, at the 780°C of the oxidation temperature, the effect of passivation is best, which can raise the minority carrier lifetime as many as 8.3 μs, and the efficiency of solar cells is up to 17.38%. Meanwhile, the oxidation at the atmosphere of nitrogen is studied. The result shows that, when the nitrogen flow is 10 L/min, the effect of passivation is improved, which can raise the minority carrier lifetime as many as 9.4 μs.
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