Atomic-scale Modification on Si(111)7×7 Surfaces

ZL MA,N LIU,WB ZHAO,QJ GU,X GE,ZQ XUE,SJ PANG
DOI: https://doi.org/10.1116/1.588238
1995-01-01
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
Abstract:In this paper the scanning tunneling microscope (STM) has been used to fabricate atomic-scale structures by removing atoms from the Si(111)7×7 surfaces at room temperature. Grooves a few nanometers in width are created. When the modification direction is along one of the base vector directions of the Si(111)7×7 surface (i.e., [1̄10], [1̄01], and [01̄1]), the grooves have atomically straight edges and lateral features as small as a 7×7 unit cell wide. The study of the modification process reflects that the atomic-scale structures are formed by extracting silicon atoms one by one from the sample surfaces. The dependence of critical current for creating a regular structure on Si(111)7×7 surface versus the bias voltage has been measured. Finally, based on the experimental data, the modification mechanism is designed.
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