Abstract:As physical processes for generating miniaturized structures increase in resolution, the types of scientific questions one can ask and answer become increasingly refined. Indeed, if one had the capability to control surface architecture on the 1–100-nm length scale with reasonable speed and accuracy, one could ask and answer some of the most important questions in science and, in the process, develop technologies that could allow for major advances in surface science, chemistry, biology, and human health. This length scale, which is exceedingly difficult to control, comprises the length scale of much of chemistry and most of biology. Indeed, chemical and biochemical recognition events are essentially sophisticated examples of pattern-recognition processes. Therefore, if one could pattern on this length scale with control over feature size, shape, registration, and composition, one could systematically uncover the secrets of recognition processes involving extraordinarily complex molecules. Arecent invention, dip-pen nanolithography (DPN), may provide access to this type of control over surface architecture and entry into a new realm of structure-versus-function studies for chemists, biologists, physicists, and materials scientists.

Combinatorial Generation and Analysis of Nanometer- and Micrometer-Scale Silicon Features via “Dip-Pen” Nanolithography and Wet Chemical Etching

Moving Beyond Molecules: Patterning Solid-State Features Via Dip-Pen Nanolithography with Sol-Based Inks.

Fabrication of sub-50 nm solid-state nanostructures based on nanolithography

Directly Writing Nanodots on Silicon Surface by Combined-Dynamic Dip-Pen Nanolithography

Fabrication of Sub-50-nm Solid-State Nanostructures on the Basis of Dip-Pen Nanolithography

Massively Parallel Dip–Pen Nanolithography with 55 000-Pen Two-Dimensional Arrays

Dip-Pen Nanolithography: Automated Fabrication of Custom Multicomponent Sub-100-Nanometer Surface Architectures

Nanoscale Electronics Based on Two-Dimensional Dopant Patterns in Silicon

Dip-Pen Nanolithography: Controlling Surface Architecture on the Sub-100 Nanometer Length Scale

Method for Fabricating Micro/Nanostructures Via Scanning Probe Microscope and Anisotropic Wet Etching

The evolution of dip‐pen nanolithography

The Evolution Of Dip-Pen Nanolithography

Generation of Nanostructures by Scanning Near-Field Photolithography of Self-Assembled Monolayers and Wet Chemical Etching

"Dip-Pen" nanolithography on semiconductor surfaces

Block copolymer templated etching on silicon.

Growing Embossed Nanostructures of Polymer Brushes on Wet-Etched Silicon Templated Via Block Copolymers

Multiple Ink Nanolithography: Toward a Multiple-Pen Nano-Plotter

DPN-Generated Nanostructures Made of Gold, Silver, and Palladium

Sub-100 nm, Centimeter-Scale, Parallel Dip-Pen Nanolithography

Fabrication of silicon-based multilevel nanostructures via scanning probe oxidation and anisotropic wet etching