Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Block copolymer templated etching on silicon.

Graphene Masks As Passivation Layers in the Electrochemical Etching of Silicon

Controlled Grafting of Well-Defined Polymers on Hydrogen-Terminated Silicon Substrates by Surface-Initiated Atom Transfer Radical Polymerization

Growing Embossed Nanostructures of Polymer Brushes on Wet-Etched Silicon Templated Via Block Copolymers

A Facile Method of Forming Nanoscale Patterns on Poly(ethylene Glycol)-Based Surfaces by Self-Assembly of Randomly Grafted Block Copolymer Brushes.

Low-temperature plasma etching of high aspect-ratio densely packed 15 to sub-10 nm silicon features derived from PS-PDMS block copolymer patterns

A route to engineered high aspect-ratio silicon nanostructures through regenerative secondary mask lithography

Fabrication of Ordered Arrays of Silicon Nanopillars at Selected Sites

Unconventional Lithography for Patterned Nanomaterials

Plasma etch transfer of self-assembled polymer patterns

Propagation of human hepatitis A virus in cell lines of primary human hepatocellular carcinomas.

Development of Ordered, Porous (Sub-25 nm Dimensions) Surface Membrane Structures Using a Block Copolymer Approach

High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch

Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing

Fabrication of silicon-based multilevel nanostructures via scanning probe oxidation and anisotropic wet etching

Vielfalt erfordert Interdisziplinarität

Size and Morphology Control of Highly-Ordered Nano-Silicon Pillar Fabricated by Direct Nanosphere Lithography

Selective Solvent Vapor Induced Self-Assembly of Silicon-Containing Bottlebrush Block Copolymer Thin Films to Generate Mesoporous Silicon Oxide Patterns

Self-Assembly of Hierarchical Silicon-Containing Block Copolymers with Cross-Linkable 3 nm Smectic Motifs for Nanopatterning and Osmotic Energy Conversion Membranes

Block Copolymer Lithography and Transferred Patterns on the Substrate Used for SERS

Nanoscale patterning through self-assembly of hydrophilic block copolymers with one chain end constrained to surface