Abstract:Lithography techniques are currently being developed to fabricate nanoscale components for integrated circuits, medical diagnostics and optoelectronics 1 , 2 , 3 , 4 , 5 , 6 , 7 . In conventional far-field optical lithography, lateral feature resolution is diffraction-limited 8 . Approaches that overcome the diffraction limit have been developed 9 , 10 , 11 , 12 , 13 , 14 , but these are difficult to implement or they preclude arbitrary pattern formation. Techniques based on near-field scanning optical microscopy can overcome the diffraction limit, but they suffer from inherently low throughput and restricted scan areas 15 , 16 , 17 . Highly parallel two-dimensional, silicon-based, near-field scanning optical microscopy aperture arrays have been fabricated 18 , but aligning a non-deformable aperture array to a large-area substrate with near-field proximity remains challenging. However, recent advances in lithographies based on scanning probe microscopy have made use of transparent two-dimensional arrays of pyramid-shaped elastomeric tips (or ‘pens’) for large-area, high-throughput patterning of ink molecules 19 , 20 , 21 , 22 , 23 . Here, we report a massively parallel scanning probe microscopy-based approach that can generate arbitrary patterns by passing 400-nm light through nanoscopic apertures at each tip in the array. The technique, termed beam pen lithography, can toggle between near- and far-field distances, allowing both sub-diffraction limit (100 nm) and larger features to be generated.

Sub-100 nm, Centimeter-Scale, Parallel Dip-Pen Nanolithography

Massively Parallel Dip–Pen Nanolithography with 55 000-Pen Two-Dimensional Arrays

Parallel Dip-Pen Nanolithography With Arrays Of Individually Addressable Cantilevers

Thermally Actuated Probe Array for Parallel Dip-Pen Nanolithography

Dip-Pen Nanolithography: Controlling Surface Architecture on the Sub-100 Nanometer Length Scale

Design, Fabrication, and Characterization of Thermally Actuated Probe Arrays for Dip Pen Nanolithography

The Evolution Of Dip-Pen Nanolithography

Development of Parallel Dip Pen Nanolithography Probe Arrays for High Throughput Nanolithography

The evolution of dip‐pen nanolithography

MICROMACHINED ARRAYED DIP PEN NANOLITHOGRAPHY PROBES FOR SUB-100nm DIRECT CHEMISTRY PATTERNING

Materials Integration by Dip‐Pen Nanolithography

Linear probe arrays for dip-pen nanolithography

Dip Pen Nanolithography (DPN): process and instrument performance with NanoInk's Nscriptor system

Creation and Measurement of Nanodots with Combined Dynamic Mode 'Dip-Pen' Nanolithography Based on Atomic Force Microscope

Development of Two-Dimensional Scanning Probe Arrays for Dip-Pen Nanolithography (Dpn)

Beam Pen Lithography.

Directly Writing Nanodots on Silicon Surface by Combined-Dynamic Dip-Pen Nanolithography

Dip‐Pen Nanolithography Enabled Functional Nanomaterials and Their Applications

The Role of Liquid Ink Transport in the Direct Placement of Quantum Dot Emitters Onto Sub-Micrometer Antennas by Dip-Pen Nanolithography.

Dip-Pen Nanolithography: Automated Fabrication of Custom Multicomponent Sub-100-Nanometer Surface Architectures

Evolution of Dip-Pen Nanolithography (DPN): From Molecular Patterning to Materials Discovery