X-ray Photoelectron Spectroscopic Studies of Sulphur-passivated GaAsSurfaces

X Wang,XY Hou,ZS Li,XY Chen
DOI: https://doi.org/10.1002/(sici)1096-9918(19960916)24:9<564::aid-sia148>3.0.co;2-1
1996-01-01
Surface and Interface Analysis
Abstract:Three new sulphur-passivation techniques of GaAs surfaces are presented to solve the problem of longevity and durability. To explore the passivation mechanism, XPS in conjunction with other techniques are employed to study the chemical compositions of Ga and As atoms near the passivation film/substrate interfaces.
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