Abstract:With the deployment of the 5th Generation of mobile applications (5G), the performances of radio-frequency (RF) filters are pushed to their limits. Highly crystalline piezoelectric materials with an electromechanical coupling coefficient higher than aluminium nitride are of high interest. Lithium niobate (LiNbO3), with an electromechanical coupling coefficient from 5 % to 45 % for bulk waves, appears to be a promising candidate for a next generation of RF filters. However, despite decades of research, the growth of single-phased, stoichiometric and highly crystalline LiNbO3 thin films is still very challenging. In the present work, 200 nm-thick LiNbO3 films have been grown by pulsed laser deposition on congruent LiNbO3 substrates with various crystalline orientations: X-cut (i.e. (110)), Y-cut (i.e. (100)) and Z-cut (i.e. (001)). The influence of the substrate’s crystal cut on the physical and chemical properties of the LiNbO3 films is investigated. A High-Resolution X-ray Diffraction methodology is developed to characterize the crystalline properties of the homoepitaxial layers. In all cases, single-phased and epitaxial LiNbO3 thin films are obtained. These results indicate that a standard wafer-based PLD system can be used to grow LiNbO3 thin films with a crystalline quality and a stoichiometry very close to a LiNbO3 monocrystalline substrate.

Low Electric Field Induced (001) Oriented Growth of LiNbO3 Films by Pulsed Laser Ablation

Low Electrical Field Induced Oriented Growth of Ferroelectric LiNbO3thin Films and Multilayers

The Role of an Electric Field Applied During Pulsed Laser Deposition of LiNbO3 and LiTaO3 on the Film Orientation

Growth and Optical Properties of Completely C-Axis Orientated LiNbO3 Films Deposited by Pulsed Laser Deposition

Low Biased Voltage Induced Textured Growth of LiNbO3 Films on Silicon Wafer

Polarization State Dependence of Laser-Induced Domain Nucleation in Lithium Niobate Crystals Investigated by Digital Holography

Effects of substrate temperature on the growth of oriented LiNbO3 thin films by pulsed laser deposition

In-situ Poling of Lithium Niobate Films on Silicon Wafer by Applying a Low Electric Field During Pulsed Laser Deposition

Highly C-Axis Oriented LiNbO3 Thin Film Grown on SiO2/Si Substrates by Pulsed Laser Deposition

Growth of textured LiNbO3 thin film on Si (111) substrate by pulsed laser deposition

Pulsed Laser Deposition of (001) Textured LiNbO3 Films on Al2O3/SiO2/Si Substrate

Microstructure of LiNbO3 Thin Films Grown on Silicon Substrates by Pulsed Laser Deposition

Fabrication of the preferentially orientated LiNbO3 nanoparticles and their ferroelectric behaviors

GROWTH AND CHARACTERIZATION OF C-ORIENTED LiNbO3 THIN FILMS ON Si (100) BY PLD

Homo-epitaxial growth of LiNbO3 thin films by Pulsed Laser deposition

Influence of substrate temperature on the growth and optical waveguide properties of oriented LiNbO3 thin films

(012) Textured LiNbO3 Waveguiding Films Grown on SiO2 by Pulsed Laser Deposition Technique

Highly C-axis oriented LiNbO3 thin film on amorphous SiO2 buffer layer and its growth mechanism

Optical Waveguide Properties of LiNbO3 Thin Films on Silicon Substrates

GROWTH AND CHARACTERIZATION OF C-ORIENTED <font>LiNbO</font><sub>3</sub> THIN FILMS ON Si (100) BY PLD

Nonlinear Optical LiNbO3 Films Grown on Α-Sio2 and Α-Al2o3 in Waveguiding Form