Field Emission of Aluminum Nitride Nanocones Deposited on Titanium Substrate

Ye Min Hu,Zheng Hu,Fan Zhang,Ying Li,Ming Yuan Zhu,Shi Wei Wang
DOI: https://doi.org/10.4028/www.scientific.net/AMR.129-131.476
2010-01-01
Abstract:We report the preparation of quasi-arrays of aluminum nitride nanocones via chemical vapor deposition on nitriding treated titanium substrate at 800 degrees C through the reaction between AlCl3 vapor and NH3/N-2 gas. The field emission measurement exhibits a tine electron emission with the turn-on field of 10.7 V/mm. which is quite smaller than the turn-on field of 41.3 V/mu m for aluminum nitride nanocones deposited on silicon wafer in our previous works. The reduction of turn-on field is attributed to the formation of a layer of conductive tiannium nitride on titanium substrate during the nitriding treatment.
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