Study of the Initial Aluminide Phase Growth in Al/Pt Couples

XA ZHAO,E MA,HY YANG,MA NICOLET
DOI: https://doi.org/10.1016/0040-6090(87)90198-2
IF: 2.1
1987-01-01
Thin Solid Films
Abstract:The thermal reaction of thin platinum films with large-grained aluminum substrates is studied with emphasis on the growth kinetics of the initial aluminide phase. In situ d.c. sputter cleaning is performed on the large-grained aluminum substrates before the platinum film is evaporated to ensure a clean interface. Uniform layer-by-layer growth of Pt2Al3 is observed and monitored by 2 MeV4He+ backscattering. The thickness x of this initial aluminide phase grows parabolically with the annealing duration t as x2 = Kt. After the incubation period, the growth constant K is given by K = x2t= 8.76exp−1.45 eVkBT (cm2s−1) for 255°C < T < 305°C.
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