Abstract:The relevant phase transformations induced by atomic diffusion at the vicinity of Nb/TiAl heterogenous interface were systematically investigated by establishing a novel system of TiAl-Nb couple via metallurgical bonding of Nb block and γ-TiAl powders by hot pressing sintering and post-annealing treatments. As a result, the resultant diffusion layer, acting as adhesive region linking the Nb and TiAl substrates, thickened with the increase of annealing temperature and the prolongation of holding time, which could be well described by the developed power function. A series of intermediate phases initially nucleated at the Nb/TiAl interface and grew toward both substrates, which was the result of the exchange, partitioning and recombination of solute atoms in the light of vacancy-mediated substitutional diffusion pattern. The phase transformation path on the Nb side was β→η→η + σ→σ→β 0 →β 0 + γ n , while that on the TiAl side was γ→γ ss →γ ss + α→(γ + α)+ (α + β 0 )→α + β 0 →β 0 + γ n . Then the disorder-order transition of α→α 2 and β 0 →B2 occurred during cooling. The progress of phase transformation slowed down as the diffusion proceeded, which was attributed to the decrease in atomic substitution efficiency due to the reduction of atomic concentration gradient and the extension of migration distance. In such a case, the banded σ ba split into spike σ sp along the direction of maximum concentration gradient, and then shrunk to isolated σ is until completely dissolved in β 0 regime, principally dominated by Ti occupying Nb sublattices. The lenticular γ n existed mainly in the form of twins, resulting from the lattice reconstruction in accordance with the orientation relationship of 111γ//110β0 and 1̅10γ//11̅1β0 in the Al partitioning region during the spontaneous fluctuation of atomic concentration of β 0 regime. These findings filled some fundamental gaps with respect to TiAl-Nb diffusion reaction system, and afforded profound insights into the development of high-performance TiAl/Nb composites with tailorable microstructure.

INTERFACIAL REACTION BETWEEN Ti THIN FILM AND AlN CERAMIC

Study on Interfacial Reaction of Ti/AlN by SIMS, RBS and XRD

Secondary ion mass spectrometry study on composition distribution at Ti/AlN interface

Growth Kinetics of TiAl3 Layer in Multi-Laminated Ti–(TiB2/Al) Composite Sheets During Annealing Treatment

Interface Reaction of Ti and Mullite Ceramic Substrate

Stability of NiCrAlY coating/titanium alloy system under pure thermal exposure

Investigation of interfacial thermal stabilities of Nbf/TiAl composites with and without Al2O3 coating in interface

Influence Of Annealing Temperature On Film Morphology And Tribological Performance Of Tisin-Ag Coating

Diffusion, Intrusion and Reaction Between Al-Containing Intermetallics and TiC Sintered Body During Thermal Pressure Holding

Orderly Nucleation and Competitive Growth Behaviors of Ti-Al Intermetallic Compounds in Ti/TiAl3 Diffusion Couple under High Temperature

Interface reactions of an Ag/Cr/AlN sandwich during annealing between 250 and 650 °C

Atomic diffusion and microstructural evolution at the Nb/TiAl heterogenous interfaces during annealing at elevated temperatures

Growth Characterization of Intermetallic Compound at the Ti/Al Solid State Interface

Interatomic Interaction at the Al–TiC Interface

The Interface Diffusion and Chemical Reaction Between a Ti Layer and a Diamond Substrate

Fabrication, microstructures and optical reflectivity of TiAlN/NiCr composite coating

High-temperature Annealing Effects on Epitaxial TiN Films on 4H-Sic

Reaction behaviors occurring in Ti/Al foil metallurgy

TiAl3 nucleation mechanism and atomic-scale interface features in the Al/Ti composite structures

Phase Composition, Hardness, and Thermal Shock Properties of AlCrTiN Hard Films with High Aluminum Content

Phase Formation in Annealed Sputtered (Fe,ti)-N Films