Abstract:The relevant phase transformations induced by atomic diffusion at the vicinity of Nb/TiAl heterogenous interface were systematically investigated by establishing a novel system of TiAl-Nb couple via metallurgical bonding of Nb block and γ-TiAl powders by hot pressing sintering and post-annealing treatments. As a result, the resultant diffusion layer, acting as adhesive region linking the Nb and TiAl substrates, thickened with the increase of annealing temperature and the prolongation of holding time, which could be well described by the developed power function. A series of intermediate phases initially nucleated at the Nb/TiAl interface and grew toward both substrates, which was the result of the exchange, partitioning and recombination of solute atoms in the light of vacancy-mediated substitutional diffusion pattern. The phase transformation path on the Nb side was β→η→η + σ→σ→β 0 →β 0 + γ n , while that on the TiAl side was γ→γ ss →γ ss + α→(γ + α)+ (α + β 0 )→α + β 0 →β 0 + γ n . Then the disorder-order transition of α→α 2 and β 0 →B2 occurred during cooling. The progress of phase transformation slowed down as the diffusion proceeded, which was attributed to the decrease in atomic substitution efficiency due to the reduction of atomic concentration gradient and the extension of migration distance. In such a case, the banded σ ba split into spike σ sp along the direction of maximum concentration gradient, and then shrunk to isolated σ is until completely dissolved in β 0 regime, principally dominated by Ti occupying Nb sublattices. The lenticular γ n existed mainly in the form of twins, resulting from the lattice reconstruction in accordance with the orientation relationship of 111γ//110β0 and 1̅10γ//11̅1β0 in the Al partitioning region during the spontaneous fluctuation of atomic concentration of β 0 regime. These findings filled some fundamental gaps with respect to TiAl-Nb diffusion reaction system, and afforded profound insights into the development of high-performance TiAl/Nb composites with tailorable microstructure.

Secondary ion mass spectrometry study on composition distribution at Ti/AlN interface

Study on Interfacial Reaction of Ti/AlN by SIMS, RBS and XRD

INTERFACIAL REACTION BETWEEN Ti THIN FILM AND AlN CERAMIC

Atomic diffusion and microstructural evolution at the Nb/TiAl heterogenous interfaces during annealing at elevated temperatures

TiAl3 nucleation mechanism and atomic-scale interface features in the Al/Ti composite structures

The Influence of Columnar Microstructure on Diffusion Reaction Between Ti Thin Films and Aluminum Nitride Ceramics

Nial3 Formation in Al/Ni Thin-Film Bilayers with and Without Contamination

Orderly Nucleation and Competitive Growth Behaviors of Ti-Al Intermetallic Compounds in Ti/TiAl3 Diffusion Couple under High Temperature

Investigation of the ordering and atomic site occupancies of Nb-doped TiAl/Ti3Al intermetallics

Influence of Target Current on Microstructures and Stoichiometries of TiAlN Coating Deposited by Arc Ion Plating

Interface structure of TiAlN/Ti multi-composite compound coating

Investigation of Interfacial Microstructures of TiN/AlN Multilayers by Neutron Reflectometry

First-principles Calculations of the AlN/Ti Interface Properties

Rapid Thermal Annealing of TI-ALN Interfaces

Synthesis and characterization of nanocrystalline Ti(1-x)Al(x)N by reactive magnetron sputtering

Growth Characterization of Intermetallic Compound at the Ti/Al Solid State Interface

Study on the Nucleation Mechanism of Carbonitrides on LaAlO 3 in GH4742 superallloy

Investigation of the Site Occupation of Atoms in Pure and Doped TiA1/Ti3Al Intermetallic

Fabrication, microstructures and optical reflectivity of TiAlN/NiCr composite coating

Tribological Properties of Ti-Al-N Films Prepared by Plasma-Based Ion Implantation Mixing

The effect of N+-implanted aluminum substrate on the mechanical properties of TiN films