Field Related Passivation of Interface Trap after High-Field Electron Injection

YJ Wu,CH Tan,MZ Xu,YY Wang
DOI: https://doi.org/10.1049/el:19980508
1998-01-01
Electronics Letters
Abstract:A new experimental result for field related passivation of interface traps after high-field electron injection is presented, showing that passivation can be enhanced by positive low-field bias. Decay of the positive oxide charge is also obtained simultaneously indicating that there is no conversion of trapped holes into interface traps.
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