Preferential Sputtering of LiF Surfaces Monitored by Photoelectron Spectroscopy and Direct Recoil Spectrometry

Jie-Nan Chen,J.Wayne Rabalais
DOI: https://doi.org/10.1016/0039-6028(86)90044-0
1986-01-01
Surface Science Letters
Abstract:Changes in the Li 1s and F 2s X-ray photoelectron (XPS) intensities coupled with changes in the Li and F direct recoil intensities induced by 3 keV Ar+ bombardment of a LiF surface show that the damage saturates at a dose of ~1.7 × 1017ionscm2 with a steady-state stoichiometry of Li4F3. The directly recoiled Li and F flux contains 50% Li+, 21% F−, and 14% F+; these ion fractions are sensitive to the degree of surface damage, exhibiting a decrease to a saturation level at high ion doses. These decreases in ion fractions are consistent with metallization of Li and neutral F formation in the damaged surface.
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