Barrier-Height-Enhanced <i>n</i>-GaN Schottky Photodiodes Using a Thin <i>p</i>-GaN Surface Layer

Hao Jiang,Takashi Egawa,Hiroyasu Ishikawa,Yanbo Dou,Chunlin Shao,Takashi Jimbo
DOI: https://doi.org/10.1143/JJAP.43.4101
2004-01-01
Abstract:A p(+)-GaN surface layer of 15 nm was incorporated in n-GaN Schottky photodiode to enhance the effective Schottky barrier height. A barrier height of 1.09 eV for the normal n-GaN Schottky photodiode was increased to the effective barrier height of 1.16 eV. The resulting photodiodes show a reverse dark current density of as low as 4.8 x 10(-10) A/cm(2) at -2 V bias, which is about three orders of magnitude lower than that of the normal n-GaN Schottky photodiode. The lower dark current leads to a significant improvement in the visible rejection ratio. A peak responsivity of 107 mA/W was obtained at -2 V bias under the incident power density of 10muW/cm(2), corresponding to an external quantum efficiency of 38%.
What problem does this paper attempt to address?