Barrier-Height-Enhanced n-GaN Schottky Photodiodes Using a Thin p-GaN Surface Layer

Hao Jiang,Takashi Egawa,Hiroyasu Ishikawa,Yanbo Dou,Chunlin Shao,Takashi Jimbo
DOI: https://doi.org/10.1143/jjap.43.4101
IF: 1.5
2004-01-01
Japanese Journal of Applied Physics
Abstract:A p+-GaN surface layer of 15 nm was incorporated in n-GaN Schottky photodiode to enhance the effective Schottky barrier height. A barrier height of 1.09 eV for the normal n-GaN Schottky photodiode was increased to the effective barrier height of 1.16 eV. The resulting photodiodes show a reverse dark current density of as low as 4.8×10-10 A/cm2 at -2 V bias, which is about three orders of magnitude lower than that of the normal n-GaN Schottky photodiode. The lower dark current leads to a significant improvement in the visible rejection ratio. A peak responsivity of 107 mA/W was obtained at -2 V bias under the incident power density of 10 µW/cm2, corresponding to an external quantum efficiency of 38%.
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