Effect of deposition temperature on structure and optical property of TiO2 film prepared by reactive electron beam evaporation

杨陈,樊慧庆,惠迎雪
DOI: https://doi.org/10.3969/j.issn.1007-2276.2006.z2.043
2006-01-01
Infrared and Laser Engineering
Abstract:TiO_2 has high refractive index and plays an important role in the fields of optics.In this article,TiO_2 films are prepared on glass substrate by ion beam assistant reactive electron beam evaporation.Ti is used as the evaporated material and high purity O_2(99.99%)is used as the thermal oxidative gas.TiO_2 films have been deposited at 50℃,150℃ and 300℃ respectively.Then as-deposited TiO_2 films are annealed in vacuum at 450℃ for 1h. Structures and optical properties of TiO_2 films are studied with XRD,SEM,OM and Ellipsometry.As a result,a TiO_2 film can be prepared with compact structure and high refractive index when a high deposition temperature is used.
What problem does this paper attempt to address?