Abstract:Publication date: 25 October 2021 Source: Journal of Nano Research Vol. 70 Author(s): Houssem Eddine Doghmane, Fatiha Challali, Tahar Touam, Azeddine Chelouche, Djamel Djouadi Titanium dioxide thin films were deposited by radio frequency sputtering on glass substrates at different substrate temperatures. Hence, we first optimized the preparation conditions and parameters which offer better control and reproducibility of film fabrication. Then, we investigate the structural, morphological and optical properties of the prepared titanium dioxide thin films. To do so, we used several characterization techniques: X-ray diffraction, Raman spectroscopy, scanning electron microscopy, atomic force microscopy and ultraviolet-visible spectroscopy. Interesting results were obtained, e.g. X-ray diffraction analysis shows that the films crystallize only in the anatase tetragonal structure with a preferential orientation along the (101) plane. The intensity of the (101) diffraction peak and the crystallite size are found to increase with increasing substrate temperature, indicating a crystallinity improvement of the films. Raman peaks observed around 144, 197, 399, 515 and 639 cm−1 confirm that all samples possess anatase phase and the crystallinity is enhanced with increasing substrate temperatures. The analysis of scanning electron microscopy and atomic force microscopy images demonstrates that increasing the substrate temperature significantly affects the morphology, grain size and surface roughness of TiO2 films. The ultraviolet-visible spectroscopy analysis put into evidence that the film deposited at RT is highly transparent in the visible region with average transmittance greater than 84%. Higher substrate temperatures result in a slight decrease of transmittance. Moreover, the direct optical band gap decreases while the refractive index increases with increasing the substrate temperature. Thus, the obtained results reveal that ultraviolet-visible can be considered as a potential material for optical and photovoltaic applications.

Radio Frequency Magnetron Sputtering Growth of Titanium Dioxide Thin Films: Effects of Substrate Temperature on Microstructural and Optical Properties

Controllable Hydrothermal Synthesis, Optical and Photocatalytic Properties of TiO2 Nanostructures

The Influence of Substrate Temperature on the Electrical and Optical Properties of Titanium Oxide Thin Films Prepared by D.c. Reactive Magnetron Sputtering

Effect of the Substrate Temperature on the Crystallization of TiO2 Films Prepared by DC Reactive Magnetron Sputtering

Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering

Influence of Substrate on Structural, Morphological and Optical Properties of TiO2 Thin Films Deposited by Reaction Magnetron Sputtering

Crystallization Behaviors of TiO2 Films Derived from Thermal Oxidation of Evaporated and Sputtered Titanium Films

TiO2 films prepared by DC reactive magnetron sputtering at room temperature: Phase control and photocatalytic properties

Effect of substrate temperature and annealing on the growth of TiO2‐x thin films deposited by using DC‐magnetron sputtering technique

Influence of Annealing Temperature on the Properties of Titanium Oxide Thin Film

Tunable thermo-optical performance promoted by temperature selective sputtering of titanium oxide on MgO-ZrO2 coating

Temperature-dependent optical properties of titanium oxide thin films studied by spectroscopic ellipsometry

Structural and Optical Properties of Titanium Oxide Thin Films Deposited on Unheated Substrate at Different Total Pressures by Reactive Dc Magnetron Sputtering with A Substrate Bias

Characterization of Titanium Dioxide Thin Films Grown on Glass Substrate by Gasified-Thermal-Carrier-Assisted Evaporation Technique: Impact of Deposition Time

Metallic Sputtering Growth of Crystalline Titanium Oxide Films on Unheated Glass Substrate Using Inductively Coupled Plasma Assisted Direct Current Magnetron Sputtering

The effect of temperature on optical properties of TiN films prepared by direct current magnetron sputtering

Preparation and Properties of Titanium Oxide Thin Film by Midfrequency Alternative Reactive Magnetron Sputtering Technique

STRUCTURE AND OPTICAL PROPERTIES OF HIGH-RATE LOW-TEMPERATURE GROWN TiO2 THIN FILMS BY REACTIVE MAGNETRON SPUTTERING

Impact of substrate temperature on the microstructure, electrical and optical properties of sputtered nanoparticle V2O5 thin films

Synthesis, Phase Transition and Optical Properties of Nanocrystalline Titanium Dioxide Films Deposited by Plasma Assisted Reactive Pulsed Laser Deposition

Studies of Photo-induced Characteristics of Nanoscale Titanium Dioxide Thin Films Grown by RF Magnetron Sputtering