Sticking probability of metal halide molecules incident upon refractory metal surfaces heated in high vacua

hiroyuki kawano,kiyohiko funato,takanori maeda,yongfa zhu
DOI: https://doi.org/10.1016/S0169-4332(97)00206-7
IF: 6.7
1997-01-01
Applied Surface Science
Abstract:The sticking probability (sigma) of metal halides (MX, for example, NaBr, CsF and TlCl) impinging with various fluxes (10(10)-10(14) molecules cm(-2) s(-1)) upon polycrystalline surfaces of refractory metals (Re and W) heated to a high temperature (T-S, 900-2300 K) in readily attainable high vacua (10(-5)-10(-3) Pa) was determined by a thermal positive ionization method. Namely, (1) a molecular beam of MX effusing from a Knudsen cell heated to various temperatures (T-C, 550-900 K) was directed onto the surface, (2) the ion current (I+) of positive ions (M+) emitted from the surface was measured as a function of either T-S or T-C, (3) the apparent vapor pressure (sigma P) of MX in the cell was evaluated from the data on I+ and T-C according to our method and (4) our data on sigma P was compared with literature values of P determined by various methods. In all the sample/surface systems thus studied, sigma was essentially unity irrespective of the condition whether the surface was virtually clean or fully covered with residual gases below 10(-3) Pa. (C) 1997 Elsevier Science B.V.
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