Effect of oxygen or copper impurities on the work function of cesiated surfaces under co-existence with hydrogen: A study about negative hydrogen ion sources for neutral beam injection systems
Heng Li,Xin Zhang,Yuhong Xu,Guangjiu Lei,Sanqiu Liu,Katsuyoshi Tsumori,Haruhisa Nakano,Masaki Osakabe,Mitsutaka Isobe,Shoichi Okamura,Akihiro Shimizu,Kunihiro Ogawa,Hiromi Takahashi,Zilin Cui,Jun Hu,Yiqin Zhu,Xiaolong Li,Huaqing Zheng,Xiaoqiao Liu,Shaofei Geng,Xiaochang Chen,Haifeng Liu,Xianqu Wang,Hai Liu,Changjian Tang,CFQS team
DOI: https://doi.org/10.1016/j.nme.2024.101792
IF: 3.037
2024-10-31
Nuclear Materials and Energy
Abstract:This study investigates the effect of oxygen and copper impurities on the work function of the Cs/H/Mo (001) surface based on the Density Functional Theory (DFT) method. First, the deposition of 2/16 θ impurities on the Cs 0.5 /H 0.5 /Mo (001) surface (the subscript 0.5 represents 8/16 θ coverage) is studied. It is found that the deposition of impurities beneath the cesium layer and oxygen impurities as atoms, and in a high-symmetry configuration, both lower the surface system energy. As the impurity coverage increases, it is observed that impurity deposition with a coverage of less than or equal to 8/16 θ effectively reduces the work function of the Cs 0.5 /H 0.5 /Mo (001) surface. However, as the cesium and hydrogen coverage increases, the impurities are no longer effective at reducing the work function. Moreover, when the cesium coverage reaches 16/16 θ, the surface work function approaches that of a cesium metal surface. Another important discovery is that when oxygen impurities are deposited above the cesium layer on the Cs 0.5 /H 0.5 /Mo (001) surface, a reduction in the surface work function is observed. This anomalous phenomenon is attributed to significant charge polarization caused by the deposition of oxygen impurities. The migration barriers of impurities traversing the dense cesium layer to the Mo (001) substrate are evaluated using the climbing image nudged elastic band (CI-NEB) method. Oxygen impurities tend to traverse the cesium layer in molecular form, facing a minimum barrier of 0.52 eV, while copper atoms encounter a lower barrier of 0.09 eV when traversing the cesium layer.
nuclear science & technology