Abstract:This work presents a study of the structural, morphological, and optical properties of titanium dioxide thin films prepared via plasma enhanced chemical vapour deposition at the floating potential (Vf) or substrate bias (Vb) of − 10 and − 50 V, after being submitted to annealing processes varying the temperature from 450 to 850 °C. By tuning the annealing temperature and substrate bias voltage respectively, which could be helpful for the explanation about the thermal effect and the influence of ion bombardment on TiO2 films obtained from low-temperature plasma deposition. The results have shown that the TiO2 thin films grown at Vf and − 10 V persist in the anatase phase even after annealing at 850 °C. The phase transformation from anatase to rutile occurred in the case of − 50 V, and the crystallization enhancement has been identified as the annealing temperature increased. From scanning electron microscopy measurements, the formation of gradient columnar morphology was also perceived in the cases of Vf and − 10 V, with increasing annealing temperature at 850 °C, these structures disappear transforming into homogeneous columns with larger size at Vf and granular structure at − 10 V. In the case of − 50 V, a well-organized columnar morphology has been found in the as-deposited film, and it also can be modified into granular structure with the post-annealing effect at 850 °C but without thickness reduction. Spectroscopic ellipsometry (SE) study was used to determine the effect of annealing temperature on the thickness and on the optical constant of TiO2 thin films. SE shows that the band gap of TiO2 thin films was found to decrease when the annealing temperature increases. Meanwhile, the annealing temperature of 450 °C leads to a decrease of refractive indices of the films grown at Vf and − 10 V, but has no effect on the film of − 50 V. Then further increase of annealing temperature at 850 °C, an improvement of refractive indices can be identified for all the films deposited with various bias voltages.

Bias Voltages and Growth of Sputtered Al_2O_3 Films on Polythylene Terephthalate Substrates

Effects of Process of the Al_2O_3 Film Deposited by Magnetron Sputtering on PET Substrate Temperature

Influence of Substrate Bias on Properties of TiN Films with X-ray Photoelectron Spectroscopy and Atomic Force Microscopy Studies

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Effects of Bias Voltage on Structure and Properties of Tial-Doped A-C:H Films Prepared by Magnetron Sputtering

Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth

Growth of Silica Films on Polythylene Terephthalate Substrates by RF Magnetron Sputtering

The Effect of Applied Substrate Negative Bias Voltage on the Structure and Properties of Al-containing A-C:H Thin Films

Influences of Ion Etching on Al_2O_3 Films Deposited by Magnetron Sputtering

Influences of Bias Voltage on Mechanical and Tribological Properties of Ti–Al–C Films Synthesized by Magnetron Sputtering

Influence of Reactive Surface Groups on the Deposition of Oxides Thin Film by Atomic Layer Deposition

Properties of PET/ITO Thin Films Deposited by DC Magnetron Sputtering

Effect of substrate temperature and bias voltage on the properties in DC magnetron sputtered AlN films on glass substrates

Nucleation and Growth Study of Al2O3 Film Fabricated Through Atomic Layer Deposition on Pet Substrate

Effect of Substrate Bias on the Structure and Properties of Multi-Element (alcrtatizr)n Coatings

Reactive remote plasma sputtering of TiOx thin films and controlled growth of textured single-phase rutile using rf substrate biasing

Selective-area ALD for Positively and Negatively Charged Layers into the Ion-Beam Track-Etched Conical Pores in Polyethylene Terephthalate

Effect of Sputtering Process on Deposition Rate and Dielectrical Properties of Ba0.5Sr0.5TiO3 Thin Films

The Growth Mechanisms of TiO2 Film Onto PET Surfaces by Atomic Layer Deposition

TiO2 films prepared by DC reactive magnetron sputtering at room temperature: Phase control and photocatalytic properties

Annealing and Biasing Effects on the Structural and Optical Properties of PECVD-grown TiO2 Films from TTIP/O2 Plasma