Abstract:This study reports on the properties of nitrogen doped titanium dioxide (TiO2) thin films considering the application as a transparent conducting oxide (TCO). Sets of thin films were prepared by sputtering a titanium target under oxygen atmosphere on a quartz substrate at 400 or 500 °C. Films were then doped at the same temperature by 150 eV nitrogen ions. The films were prepared in Anatase phase which was maintained after doping. Up to 30 at% nitrogen concentration was obtained at the surface, as determined by in situ X-ray photoelectron spectroscopy (XPS). Such high nitrogen concentration at the surface lead to nitrogen diffusion into the bulk which reached about 25 nm. Hall measurements indicate that average carrier density reached over 1019 cm−3 with mobility in the range of 0.1–1 cm2 V−1 s−1. Resistivity about 3 · 10−1 Ω cm could be obtained with 85% light transmission at 550 nm. These results indicate that low energy implantation is an effective technique for TiO2 doping that allows an accurate control of the doping process independently from the TiO2 preparation. Moreover, this doping route seems promising to attain high doping levels without significantly affecting the film structure. Such approach could be relevant for preparation of N:TiO2 transparent conducting electrodes (TCE).

Optical Properties and Microstructure of Nitrogen-Doped SrTiO3

Magnetic Properties of Nitrogen Doped SrTiO3

Structure and Properties of Nitrogen-Doped Titanium Dioxide Thin Films Grown by Atmospheric Pressure Chemical Vapor Deposition

First-principles Study of Nitrogen Doping and Oxygen Vacancy in Cubic PbTiO3

Microstructures and Properties of N-Doped TiO_2 Films Grown by Dielectric Barrier Discharge Chemical Vapor Deposition

Photoluminescence of Nitrogen Doped SrTiO3

Microstructures and Properties of N-Doped TiO_2 Films Grown by Atmospheric Pressure Chemical Vapor Deposition

Magnetism of a Nitrogen-Implanted TiO 2 Single Crystal

Photoelectrochemical and Optical Properties of N-doped TiO2 Thin Films Prepared by Oxidation of Sputtered TiNx Films

Photo-oxidation properties of nitrogen doped SrTiO3 made by mechanical activation

Preparation and characterization of nitrogen doped SrTiO3 photocatalyst

Band Structures of TiO 2 Doped with N, C and B

The Structure and Properties of V Doped TiN Films Prepared at Various Temperatures

Study of nitrogen ion doping of titanium dioxide films

The Microstructure, Optical and Magnetic Property of Nitrogen Implanted Sio2

Sol-Gel Preparation of N-doped TiO2 Nanocrystalline at Low Temperature

Structure, Electrical and Optical Properties of TiNx Films by Atmospheric Pressure Chemical Vapor Deposition

Microstructure and Photoluminescence of Carbon and Nitrogen Dual Doped Tio2 Powders

Electrochromic properties of nitrogen doped titanium dioxide films

Effects Of Nitrogen Incorporation On The Electronic Structure Of Rutile-Tio2

Preparation and Photocatalytic Activity of Visible Light-Active Sulfur and Nitrogen Co-Doped SrTiO3