Abstract:N-type polycrystalline higher manganese silicide ( MnSi 1.7) films are prepared on thermally oxidized silicon substrates by magnetron sputtering. MnSi 1.85, Si , and carbon targets are used in the experiments. By co-sputtering of the MnSi 1.85 and Si targets, n-type MnSi 1.7 films are directly obtained. By increasing the Si content to the deposited films, both the Seebeck coefficient and electrical resistivity increase to high values. A Si intermediate layer between the MnSi 1.7 film and substrate plays an important role on the electrical properties of the films. Without the interlayer, the Seebeck coefficient is not stable and the electrical resistivity is higher. For preparation of MnSi 1.7 films by solid phase reaction, a sandwich structure Si / MnSi x/ Si (x < 1.7) and thermal annealing are used. A carbon cap layer is used as a doping source. With the carbon doping, the electrical resistivity of the MnSi 1.7 film decreases, while the Seebeck coefficient increases slightly. For reactive deposition, the MnSi x (x < 1.7) film is directly deposited on the heated substrate with a Si intermediate layer. By using a Si cap layer, a MnSi 1.7 film with a Seebeck coefficient of -292 μ V/K and electrical resistivity of 23 × 10-3 Ω- cm at room temperature is obtained. The power factor reaches 1636 μW/mK2 at 483 K. With such a high power factor, the n-type MnSi 1.7 material may be superior to p-type MnSi 1.7 material for the development of thermoelectric generators. Several smaller (0.036 - 0.099 eV ) and intermediate (0.10 - 0.28 eV ) activation energies are observed from the curves of logarithm of the resistivity versus reciprocal temperature. The larger activation energies (0.35 - 1.1 eV ) are consistent with the reported energy band gaps for higher manganese silicides.

INFLUENCE OF OXYGEN IMPURITY ON SEEBECK COEFFICIENT OF NANOSCALE MnSi1.7 FILMS

INFLUENCE OF SILICON ADDITION ON SEEBECK COEFFICIENT OF MnSi1.7 FILMS

The Effect of Oxygen on the Formation of Manganese Silicide

Preparation of n-type nano-scale MnSi1.7 films by addition of iron

Thermoelectric Power of Nanoscale Mnsi1.7 Films

Influence of Annealing on the Properties of Mn and N Co-Doped Zn0.88Mn0.12O:N Films

Annealing effect on electrical properties of high-k MgZnO film on silicon

PREPARATION OF N-TYPE HIGHER MANGANESE SILICIDE FILMS BY MAGNETRON SPUTTERING

SEEBECK EFFECT OF NANO-SCALE P-TYPE SILICON FILMS ABOVE ROOM TEMPERATURE

Layer-by-layer Deposition of MnSi1.7 Film with High Seebeck Coefficient and Low Electrical Resistivity

PREPARATION AND CHARACTERIZATION OF MnSi1.7 THIN FILMS

Aging Improvement of Mn–Zn–Ni–Mg–Al–O High-Entropy Oxide Films

Thermoelectric Properties of Mnsi1.7 Films with Addition of Aluminum and Carbon

Latest development of MnSi1.7 semiconducting films

Influence of Mn–Si elements on the kinetics of oxidative phase transformation under continuous cooling conditions and modeling study

Annealing Effect on the Electronic Structure and Magnetic Properties of Mn-doped ZnO Films

Influence of Annealing Atmosphere on the Magnetic Properties of Sio2/Fe/Sio2 Sandwiched Nanocomposite Films

Enhancement Of Thermoelectric Power Factor Of Mnsi1.7 Films By Si Addition And Modulation Doping

Effects of in-situ oxidation and annealing on Mn–Co–Ni–Cu–O thin films

Thermoelectric Properties of P‐type Higher Manganese Silicide Films Prepared by Solid Phase Reaction and Reactive Deposition