Magnetoresistance and Microstructure Evolution Upon Rapid Thermal Annealing of Giant Magnetoresistive Co/Cu/Co/CoNbZr Multilayers

QY Wen,HW Zhang,XD Jiang,XL Tang,WL Zhang
DOI: https://doi.org/10.1016/j.vacuum.2004.05.002
IF: 4
2004-01-01
Vacuum
Abstract:The magnetoresistance (MR) variation of Co/Cu/Co/CoNbZr spin valves as a result of rapid thermal annealing has been investigated. MR ratio of 3.8% was obtained in the as-deposited sample and a considerable increase to 6.86% was observed in the 450°C×60s treated sample. Microstructure studies show that the enhancement of MR ratio is a consequence of the nano-crystallization of amorphous CoNbZr soft layer. The nano-crystallized CoNbZr possess fine and dense microstructure and excellent electrical and soft magnetic properties which leads to the MR enhancement. With increasing annealing temperature or annealing time, interface roughness caused by rapid grain growth decrease the MR ratio rapidly. XRD studies imply that the interfusion of Cu atom into the Co layer is another possible degradation mechanism of Co/Cu/Co/CoNbZr spin valves at annealing temperature beyond 550°C.
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