Abstract:Owing to their remarkable electronic properties, silica ultrathin films have been utilized as an insulating layer in nanoelectronics systems. Silica films have been epitaxially grown on different substrates using various synthesis methods. Among all fabrication approaches, chemical vapor deposition has long been an advanced method for synthesizing two-dimensional (2D) materials due to its ability to ensure precise stacking control and minimize contamination between layers. This study harnessed the potential of CVD to atomically fabricate thin layered 2D silica on a SiO 2 /Si substrate. Significantly, a unique combination of multiple transition metals and salt as the catalysts aided the formation of 2D silica for the first time. Salt is a crucial catalyst in promoting the evaporation of high-melting-point metal catalysts, resulting in hexagonal nucleation sites on the SiO 2 /Si wafer. By meticulously controlling growth parameters, a distinctive hexagonal structure was obtained. Correspondingly, this work delves into the growth mechanism of 2D silica, as evidenced by experiments involving salt alone and individual transition metals. Group VB transition metals played a prominent role in achieving the hexagonal structure compared to their group IVB counterparts. This research offers insights into the formation and growth mechanisms of 2D silica, expanding the understanding of silica nanostructures.

Atomic Structure of a Thin Silica Film on Amo(112)substrate: A Combined Experimental and Theoretical Study

Atomic Structure Of A Thin Silica Film On A Mo(112) Substrate: A Two-Dimensional Network Of Sio4 Tetrahedra

Thickness Dependence of Properties of Plasma-Deposited Amorphous SiO2 Films

Properties of plasma-deposited amorphous SiO2 films

A study of plasma-deposited amorphous SiOx:H (0⩽x⩽2.0) films using infrared spectroscopy

Study of plasma-deposited amorphous SiO2 films using infrared absorption techniques

Formation of One-Dimensional Crystalline Silica on a Metal Substrate

The Dissociated Amorphous Silica Surface: Model Development and Evaluation.

Interplay Between Theory and Experiment in the Quest for Silica with Reduced Dimensionality Grown on a Mo(112) Surface

Surface Science Letters Formation of one-dimensional crystalline silica on a metal substrate

Cross-Sectional Structure Of Tetrahedral Amorphous Carbon Thin Films

X-ray Diffraction Studies of Trilayer Oscillations in the Preferred Thickness of in Films on Si(111)

Formation mechanism of two-dimensional hexagonal silica on SiO 2 /Si substrate

Stable single-layer honeycomb like structure of silica

Shrunk Lattice Structure and Interdiffusion Characteristics of 5 Nm Thick Al(2)O(3) Ultrathin Films Sputtered on Silicon.

Self-Consistent Electronic-Structure and Chemisorption Bonding of Oxygen on Al(111) Surfaces

Formation, Structures and Electronic Properties of Silicene Oxides on Ag(111)

Formation Mechanism of Zn2SiO4crystal and Amorphous SiO2in ZnO/Si System

Structural Properties of Self-Organized Organo-Silicon Macromolecular Films Investigated by Scanning Tunneling Microscopy and X-ray Diffraction

Surface structure of the 3x3-Si phase on Al(111), studied by the multiple usages of positron diffraction and core-level photoemission spectroscopy

On the electronic structure of MoSi2(OOl) surface