Molecular Self-Assembly Combined with Electroless Copper Plating of Laser-Induced Patterning on Polyimide Film

陈东升,路庆华
DOI: https://doi.org/10.16577/j.cnki.42-1215/tb.2009.11.021
2009-01-01
Abstract:A new method for molecular self-assemblyand electroless Cu plating of laser-induced patterning on polyim-ide film is reported. Thus the surface of the polyimide film washydrolyzed using aqueous KOH, followed by entrapping of Agnanoparticles via ion-exchange and annealing at elevated temper-ature. Then dodecanethiol monolayer was self-assembled on thepolyimide film doped with Ag nanoparticles. Desired microscalepattern was generated on the self-assembled monolayer by directlaser writing, and copper was then selectively deposited on thepatterned areas by electroless plating. Various processes for pre-paring the patterned electroless Cu coating were analyzed using anX-ray photoelectron spectroscope, an atomic force microscope, ascanning electron microscope, an attenuation total reflectanceFourier transformation infrared spectrometer, a semiconductorcharacterization system, and a video based contact angle meter.It has been found that the deposited copper line has a width of 30urn and good selectivity and conductivity. As a new technologyfor electroless Cu plating, the present process could be well ap-plied in electronic industry.
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